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Search Publications by: Jabez J McClelland (Fed)

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Displaying 76 - 100 of 144

Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic Beam Imaging

September 1, 1997
Author(s)
A Bard, K K. Berggren, J L. Wilbur, John D. Gillaspy, S L. Rolston, Jabez J. McClelland, William D. Phillips, M Prentiss, G M. Whitesides
We used a beam of noble gas atoms in a metastable excited state to expose a thin (1.5nm self-assembled monolayer resist applied over a gold-coated silicon wafer. We determined exposure damage as a function of dose of metastable atoms by processing the

Nanofabrication via Atom Optics with Chromium

February 10, 1997
Author(s)
Jabez J. McClelland, W Anderson, Robert Celotta
Through the use of light forces exerted by near-resonant laser light, chromium atoms are focused as they deposit onto a substrate, forming nanometer-scale structures on the surface. The laser light is in the form of a standing wave, in which each node acts

Laser Collimation of a Chromium Beam

February 1, 1997
Author(s)
R E. Scholten, R Gupta, Jabez J. McClelland, Robert Celotta, M Levenson, M Vangel
We have studied laser collimation of a chromium atomic beam using a transverse polarization gradient cooling scheme. We present detailed measurements of the angular distribution of atoms on the beam axis, over a broad range of laser intensities and

Nanostructure Fabrication via Laser-Focused Atomic Deposition

April 15, 1996
Author(s)
Robert Celotta, R Gupta, R E. Scholten, Jabez J. McClelland
Nanostructured materials and devices will play an important role in a variety of future technologies, including magnetics. We describe a method for nanostructure fabrication based on the use of laser light to focus neutral atoms. The method uses neither a

Laser Focusing of Atoms for Nanostructure Fabrication

January 1, 1996
Author(s)
Jabez J. McClelland, R Gupta, Zeina J. Kubarych, Robert Celotta
Laser-focusing of atoms has emerged as a viable form of nanofabrication. Structures are formed by focusing chromium atoms as they deposit onto a surface. The focusing occurs in a standing-wave laser field in one or two dimensions, resulting in arrays

Atom-Optical Properties of a Standing-Wave Light Field

October 1, 1995
Author(s)
Jabez J. McClelland
The focusing of atoms to nanometer-scale dimensions by a near-resonant standing-wave light field is examined from a particle optics perspective. The classical equation of motion for atoms traveling through the lens formed by a node of the standing wave is

Nanofabrication of a Two-Dimensional Array Using Laser-Focused Atomic Deposition

September 4, 1995
Author(s)
R Gupta, Jabez J. McClelland, Zeina J. Kubarych, Robert Celotta
Fabrication of a two-dimensional array of nanometer-scale chromium features on a silicon substrate by laser-focused atomic deposition is described. Features 13plus or minus}1 nm high and having a full-width at half maximum of 80plus or minus}10 nm are

Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers

September 1, 1995
Author(s)
K K. Berggren, A Bard, J L. Wilbur, John D. Gillaspy, A G. Helg, Jabez J. McClelland, S Rolston, William D. Phillips, M Prentiss, G M. Whitesides
Lithography can be performed with beams of neutral atoms in metastable excited states to pattern self-assembled monolayers (SAMs) of alkanethiolates on gold. An estimated exposure of a SAM of dodecanethiolate (DDT) to 15 to 20 metastable argon atoms per

Nanostructure Fabrication via Direct Writing with Atoms Focused in Laser Fields

May 1, 1994
Author(s)
R E. Scholten, Jabez J. McClelland, E C. Palm, A Gavrin, Robert Celotta
The techniques of atom optics can be applied during the deposition of atoms onto a surface to produce nanostructures. A laser is used to form a standing wave intensity pattern in front of the substrate. An atom beam, which has been collimated by optical

Fabricating Nanostructures Using Optical Forces on Atoms

January 1, 1994
Author(s)
R Gupta, R E. Scholten, Jabez J. McClelland, Robert Celotta
We have demonstrated the use of the optical dipole force in a standing wave to focus chromium atoms into narrow lines as they deposit onto a silicon substrate. An array of chromium lines has been fabricated, with width of 65 nm and spacing of 213 nm.

Laser Focused Atomic Deposition

January 1, 1994
Author(s)
Jabez J. McClelland, R E. Scholten, R Gupta, Robert Celotta
We demonstrate the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4
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