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Search Publications by: Jabez J McClelland (Fed)

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Displaying 126 - 150 of 276

Surface Growth in Laser-Focused Atomic Deposition

July 15, 1999
Author(s)
E Jurdik, T Rasing, K van, C Bradley, Jabez J. McClelland
We present calculations of surface growth in laser-focused nanostructure fabrication. We show that theoretical predictions of the structure profile s shape depend sensitively on the model used to describe the growth, and also on the parameters chosen

Patterning of Octadecylsiloxane Self-assembled Monolayers on Si(100) using Ar( 3 P 0 ,2) Atoms

May 1, 1999
Author(s)
Shannon B. Hill, C Haich, F Dunning, G Walters, Jabez J. McClelland, Robert Celotta, H Craighead, J Han, D Tannenbaum
We report the use of metastable (Ar 3P 0,2) atoms and a physical mask to pattern octadecylsiloxane self-assembled monolayers grown directly onsilicon surfaces. The damage to the monolayer is confirmed using lateral force microscopy, changes in

Patterning of Hydrogen-Passivated Si(100) using Ar( 3 P 0,2 ) Metastable Atoms

April 12, 1999
Author(s)
S Hill, C Haich, F Dunning, G Walters, Jabez J. McClelland, Robert Celotta, H Craighead
Patterning of silicon by exposing a hydrogen-passivated Si(100) surface to Ar( 3P 0,2) metastable atoms through a fine grid in the presence of a small backgroundpressure of oxygen is described. Metastable atom impact leads to the formation of a uniform

Minimizing Feature Width in Atom-Optically Fabricated Chromium Nanostructures

March 1, 1999
Author(s)
W Anderson, C Bradley, Jabez J. McClelland, Robert Celotta
We present a study of factors that influence the feature width of nanostructures formed by atom-optical direct-write lithography. In this process, chromium atoms travel through a standing-wave laser light field and are deposited on a surface. Due to the

Nanofabrication via Atom Optics

February 23, 1999
Author(s)
C Bradley, W Anderson, Jabez J. McClelland, Robert Celotta
Owing to the continuing reduction in the scale of microelectronic and micromagnetic technology, new microfabrication methods are constantly being explored. This is particularly true in the case of nanostructure fabrication. Here, the phenomenon of optical

Fabrication and Domain Imaging of Iron Magnetic Nanowire Arrays

May 1, 1998
Author(s)
D Tulchinsky, Michael H. Kelley, Jabez J. McClelland, R Gupta, Robert Celotta
Arrays of magnetic nanowires are fabricated by using a corrugated surface, produced by chromium atoms laser-focused in a one-dimensional standing wave, as a shadow mask for an iron evaporator. The deposited iron forms a periodic array consisting of

Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic Beam Imaging

September 1, 1997
Author(s)
A Bard, K K. Berggren, J L. Wilbur, John D. Gillaspy, S L. Rolston, Jabez J. McClelland, William D. Phillips, M Prentiss, G M. Whitesides
We used a beam of noble gas atoms in a metastable excited state to expose a thin (1.5nm self-assembled monolayer resist applied over a gold-coated silicon wafer. We determined exposure damage as a function of dose of metastable atoms by processing the

Nanofabrication via Atom Optics with Chromium

February 10, 1997
Author(s)
Jabez J. McClelland, W Anderson, Robert Celotta
Through the use of light forces exerted by near-resonant laser light, chromium atoms are focused as they deposit onto a substrate, forming nanometer-scale structures on the surface. The laser light is in the form of a standing wave, in which each node acts

Laser Collimation of a Chromium Beam

February 1, 1997
Author(s)
R E. Scholten, R Gupta, Jabez J. McClelland, Robert Celotta, M Levenson, M Vangel
We have studied laser collimation of a chromium atomic beam using a transverse polarization gradient cooling scheme. We present detailed measurements of the angular distribution of atoms on the beam axis, over a broad range of laser intensities and