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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 26 - 50 of 386

3D X-ray Metrology for Block Copolymer Lithography Line-Space Patterns

July 15, 2013
Author(s)
Daniel F. Sunday, Matthew R. Hammond, Chengqing C. Wang, Wen-Li Wu, Regis J. Kline, Gila E. Stein
We report on the development of a new measurement method, resonant critical-dimension small-angle x-ray scattering (CD-SAXS), for the characterization of the buried structure of block copolymers (BCP) used in directed self assembly (DSA). We use resonant

Critical Dimension small angel X-ray scattering measurements of FinFET and 3D memory structures

April 8, 2013
Author(s)
Regis J. Kline, Daniel F. Sunday, Chengqing C. Wang, Wen-Li Wu, Charlie Settens, Bunday Benjamin, Brad Thiel, Matyi Richard
Critical dimension small angle X-ray scattering (CD-SAXS) has been identified as a potential solution for measurement of nanoscale lithographic features by interrogating structures with sub-nanometer wavelength radiation in transmission geometry. The most

Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

April 8, 2013
Author(s)
Paul Lemaillet, Thomas Germer, Regis J. Kline, Daniel Sunday, Chengqing C. Wang, Wen-Li Wu
In this paper, we present a comparison of profile measurements of vertical field effect transistor (FinFET) fin arrays by optical critical dimension (OCD) metrology and critical dimension small angle X-ray scattering (CD-SAXS) metrology. Spectroscopic

Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme-ultraviolet lithography

May 11, 2012
Author(s)
Vivek M. Prabhu, Shuhui Kang, Wen-Li Wu, Sushil K. Satija, Christopher K. Ober, Jing Sha, Peter V. Bonnesen
Lithographic feature size requirements have approached a few radius of gyration of chemically-amplified photoresist polymers used in thin film patterning. Further, the feature dimensions are commensurate with the photoacid diffusion length that defines the

Characterization of the non-uniform reaction in chemically-amplified calix[4]resorcinarene molecular resist thin films

July 19, 2011
Author(s)
Vivek M. Prabhu, Shuhui Kang, Regis J. Kline, Dean M. DeLongchamp, Daniel A. Fischer, Wen-Li Wu, Sushil K. Satija, Jing Sha, Christopher K. Ober, Peter V. Bonnesen
The ccc stereoisomer-purified tert-butoxycarbonyloxy (t-Boc) protected calix[4]resorcinarene molecular resists blended with photoacid generator exhibit a non-uniform photoacid catalyzed reaction in thin films. The surface displays a reduced reaction extent

Lateral Uniformity in Chemical Composition along a Buried Reaction Front in Polymers

November 15, 2010
Author(s)
Kristopher Lavery, Vivek Prabhu, Sushil K. Satija, Wen-Li Wu
Off-specular neutron reflectometry was applied to characterize the form and amplitude of lateral compositional variations at a buried reaction-diffusion front. In this work, off-specular neutron measurements were first calibrated using off-specular X-ray

Photoresist latent and developer images as probed by neutron reflectivity methods

September 16, 2010
Author(s)
Vivek M. Prabhu, Shuhui Kang, David L. VanderHart, Eric K. Lin, Wen-Li Wu
Photoresist materials enable the fabrication of advanced integrated circuits with ever decreasing feature sizes. As next-generation light sources are developed, using extreme ultraviolet light of wavelength 13.5 nm, these highly-tuned formulations must

Elastic constants and dimensions of imprinted polymeric nanolines determined from Brillouin light scattering

January 18, 2010
Author(s)
Ward L. Johnson, Sudook A. Kim, Roy H. Geiss, Colm Flannery, Paul R. Heyliger, Christopher L. Soles, Wen-Li Wu, Chengqing C. Wang, Christopher M. Stafford, B D. Vogt
Elastic constants and cross-sectional dimensions of imprinted nanolines of poly(methyl methacrylate) (PMMA) on silicon are determined nondestructively from finite-element inversion analysis of dispersion curves of hypersonic acoustic modes of these

Small Angle X-Ray Scattering Measurements of Spatial Dependent Linewidth in Dense Nanoline Gratings

March 16, 2009
Author(s)
Chengqing C. Wang, Wei-En Fu, Bin Li, Huai Huang, Christopher Soles, Eric K. Lin, Wen-Li Wu, Paul S. Ho, Michael W. Cresswell
Small angle X-ray scattering (SAXS) was used to characterize the line cross section of nanoline gratings fabricated using electron beam lithography (EBL) patterning followed by anisotropic wet etching into silicon single crystal. SAXS results at normal