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Search Publications by: Igor Levin (Fed)

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Displaying 26 - 50 of 264

Tailoring the High-K Gate Dielectric/Sillicon Interface for CMOS Applications

October 12, 2021
Author(s)
Y S. Lin, R Puthenkovilakam, J P. Chang, C P. Bouldin, Igor Levin, Nhan Van Nguyen, Y Sun, P Pianetta, T Conard, W Vandervorst, V Venturo, S Selbrede
The interfacial properties, thermal stabilities, and the electrical characteristics of ZrO 2/ Si and ZrO 2/SiO 2/Si were investigated and the interfacial layer of as-deposited ZrO 2 on silicon is likely to be ZrSi xO y. The ZrO 2/ZrSi xO y/Si is

The Nanostructure Problem

October 12, 2021
Author(s)
Simon J. Billinge, Igor Levin
The powerful methods we have for solving the atomic structure of bulk crystals fail for nanostructured materials and there are currently no broadly applicable, quantitative and robust methods to replace them. The solution of this nanostructure problem is

Effects of Octahedral Tilting on the Site of Substitution of Manganese in CaTiO3

January 22, 2021
Author(s)
Russell Maier, Kevin Garrity, Matthew P. Donohue, Andrzej Ozarowski, Igor Levin
Combined electron-paramagnetic-resonance and X-ray absorption spectroscopies with first principles calculations were used to investigate the substitutional behavior of Mn ions in perovskite CaTiO3 ceramics. While transition-metal dopants in perovskite

In situ characterization of ceramic cold sintering by small-angle scattering

January 1, 2021
Author(s)
Andrew J. Allen, Igor Levin, Russell Maier, Suzanne E. Witt, Fan Zhang, Ivan Kuzmenko
The first in situ characterization of the pore morphology evolution during the cold sintering process (CSP) is presented using small-angle X-ray scattering methods. For practical reasons, measurements have been made on a model system, KH2PO4 (KDP). The

Materials Research & Measurement Needs for Ceramics Additive Manufacturing

November 1, 2020
Author(s)
Andrew J. Allen, Igor Levin, Suzanne E. Witt
We report on a recent workshop dedicated to additive manufacturing (AM) of ceramics that was held at the National Institute of Standards and Technology (NIST) in November 2019. This two- day all-invited meeting brought together experts from industry