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Search Publications by: John T. Woodward IV (Fed)

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Displaying 51 - 75 of 123

Multimodal, Nanoscale, Hyperspectral Imaging Demonstrated on Heterostructures of Quantum Dots and DNA-Wrapped Single-Wall Carbon Nanotubes

October 21, 2009
Author(s)
Hyeong G. Kang, Matthew L. Clarke, Jianyong Tang, John T. Woodward IV, Shin G. Chou, Zhenping Zhou, Angela R. Hight Walker, Tinh Nguyen, Jeeseong Hwang
A multimodality imaging technique integrating atomic force, polarized Raman, and fluorescence lifetime microscopy and a 2D autocorrelation image analysis is applied to study the properties of a mesoscopic heterostucture of nanoscale materials. This

Absolute Flux Calibration of Stars; Calibration of the Reference Telescope

June 2, 2009
Author(s)
Allan W. Smith, John T. Woodward IV, Colleen A. Jenkins, Steven W. Brown, Keith R. Lykke
Absolute stellar photometry is based on 1970s terrestrial measurements of the star Vega with instruments calibrated using the Planckian radiance from a Cu fixed-point blackbody. Significant advances in absolute radiometry have been made in the last 30

Supercontinuum Sources for Metrology

June 2, 2009
Author(s)
John T. Woodward IV, Allan W. Smith, Colleen A. Jenkins, Chungsan Lin, Steven W. Brown, Keith R. Lykke
Supercontinuum (SC) sources are novel laser-based sources that generate a broad, white-light continuum in single mode photonic crystal fibers. Currently, up to 6 W of optical power is available, spanning the spectral range from 460 nm to 2500 nm. Advances

Surface Applications of Cavity Ring-Down Spectroscopy

October 16, 2008
Author(s)
A C. Pipino, Curtis Meuse, J P. Hoefnagels, Vitalii I. Silin, John T. Woodward IV
We report preliminary results describing two new applications of cavity ring-down spectroscopy (CRDS): 1) detection of non-absorbing species by refractive-index change using surface-plasmon-resonance (SPR)-enhanced CRDS, and 2) C-H overtone detection by

Characterization of the Latent Image to Developed Image in Model EUV Photoresists

February 22, 2008
Author(s)
John T. Woodward IV, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and processing

Component Segregation in Model Chemically Amplified Resists

March 15, 2007
Author(s)
John T. Woodward IV, Theodore Fedynyshyn, David Astolfi, Susan Cann, Michael Leeson
We have applied chemical force microscopy (CFM) to probe the chemical segregation of resist materials. CFM is capable of providing simultaneous information about surface topography and chemical heterogeneity of partiallt developed resist films. We have

Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist

February 25, 2007
Author(s)
Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric K. Lin, Wen-Li Wu, John T. Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and