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Search Publications by: Martin Sohn (Fed)

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Displaying 1 - 25 of 67

Instrument Development for Spectroscopic Ellipsometry and Diffractometry in the EUV

April 24, 2024
Author(s)
Stephanie Moffitt, Bryan Barnes, Thomas A. Germer, Steven Grantham, Eric Shirley, Martin Sohn, Daniel Sunday, Charles S. Tarrio
Semiconductor devices are noted for ever-decreasing dimensions but now are also becoming more complex. While scanning probe microscopy can still resolve the smallest features, it does not have the throughput for high-volume characterization of full wafers

Reflective deep-ultraviolet Fourier ptychographic microscopy for nanoscale imaging

April 29, 2023
Author(s)
Kwanseob Park, Yoon Sung Bae, Sang-Soo Choi, Martin Sohn
Fourier ptychographic microscopy (FPM) that has high space-bandwidth-product and phase imaging capability requires significant resolution enhancement in reflection mode for imaging of nanoscale semiconductor devices. A direct way to nanoscale resolution is

Measurement sensitivity of DUV scatterfield microscopy parameterized with partial coherence for duty ratio-varied periodic nanofeatures

February 1, 2022
Author(s)
Taekyung Kim, Eikhyun Cho, Yoon Sung Bae, Sang-Soo Choi, Bryan Barnes, Richard M. Silver, Martin Sohn
The deep ultraviolet (DUV) scatterfield imaging microscopy technique enables accurate dimensional measurements of periodic nanostructures with sub-nanometer sensitivity to support semiconductor device manufacturing. A parametric sensitivity analysis for

Appraising the extensibility of optics-based metrology for emerging materials

October 4, 2019
Author(s)
Bryan M. Barnes, Mark-Alexander Henn, Martin Y. Sohn, Hui Zhou, Richard M. Silver
To advance computational capabilities beyond conventional scaling limitations, novel device architectures enabled by emerging materials may be required. Optics-based methodologies, central to modern-day process control, will be pursued by the

Assessing form-dependent optical scattering at vacuum- and extreme-ultraviolet wavelengths off nanostructures with two-dimensional periodicity

June 24, 2019
Author(s)
Bryan M. Barnes, Mark Alexander Henn, Martin Y. Sohn, Hui Zhou, Richard M. Silver
Several metamaterials and nanostructures are form birefringent, exhibiting effective refractive index differences for orthogonal polarizations due to the placement of subwavelength features if the periodicity is smaller than the incident wavelength. As the

Assessing the wavelength extensibility of optical patterned defect inspection

March 29, 2017
Author(s)
Bryan Barnes, Hui Zhou, Mark-Alexander Henn, Martin Sohn, Richard M. Silver
Qualitative comparisons have been made in the literature between the scattering off deep- subwavelength-sized defects and the scattering off spheres in free space to illustrate the challenges of optical defect inspection with decreasing patterning sizes