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Search Publications by: Nicholas Barbosa (Fed)

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Displaying 26 - 45 of 45

Evaluation of Thin Film Mechanical Properties by Means of Electrical Test Methods

September 30, 2007
Author(s)
Nicholas Barbosa, Robert Keller, David T. Read, Richard P. Vinci
The ability to measure the mechanical properties of thin films and small scale structures is essential in designing reliable components at the micro- and nano-scales. It is known that the mechanical properties of thin film materials deviate from relations

Results of a Nanoindentation Round Robin on Thin Film Copper on Silicon

January 1, 2007
Author(s)
David T. Read, Robert Keller, Nicholas Barbosa, Roy H. Geiss
Nanoindentation is used in a variety of fields to measure material hardness and elastic modulus. This test technique is especially attractive for thin films because of the difficulty of conducting tensile or other conventional mechanical characterization

Strain-Induced Grain Growth during Rapid Thermal Cycling of Aluminum Interconnects

January 1, 2007
Author(s)
Robert Keller, Roy H. Geiss, Nicholas Barbosa, Andrew Slifka, David T. Read
We demonstrate by use of automated electron backscatter diffraction (EBSD) the rapid growth of grains in non-passivated, sputtered Al-1Si interconnects during 200 Hz thermal cycling induced by alternating electric current. Mean grain diameters were

Mapping substrate/film adhesion with contact-resonance-frequency AFM

July 12, 2006
Author(s)
Donna C. Hurley, Malgorzata Kopycinska-Mueller, Eric Langlois, Tony B. Kos, Nicholas Barbosa
We demonstrate contact-resonance-frequency atomic force microscopy (AFM) techniques to nondestructively image variations in adhesion at a substrate/film interface. Contact-resonance-frequency imaging is a dynamic AFM technique to measure the contact

Electrical Methods for Mechanical Characterization of Interconnect Thin Films

September 1, 2005
Author(s)
Robert Keller, Cynthia A. Volkert, Roy H. Geiss, Andrew Slifka, David T. Read, Nicholas Barbosa, Reiner Monig
We describe the use of electrical methods for evaluating mechanical reliability and properties of patterned copper and aluminum interconnects on silicon substrates. The approach makes use of controlled Joule heating, which causes thermal strains in the