Coffey, K.
, Rudman, D.
and Foner, S.
(1992),
Thin Film Reaction Kinetics of Niobium/Aluminum Multilayers, Journal of Applied Physics
(Accessed March 22, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Thin Film Reaction Kinetics of Niobium/Aluminum Multilayers
Published
Author(s)
K. R. Coffey, , S. Foner
Citation
Journal of Applied Physics
Volume
72
Issue
4
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created August 14, 1992, Updated October 12, 2021