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Patterns written using different beam parameters and imaged in SEM from polymer side on a tilted stage for electron beam in a), b), c) and for X-rays in d), e). Beam parameters used are a) 5 kV b) 20 kV, 15 kV, 10 kV 3 kV, c) 5 kV for varying currents d)

Patterns written using different beam parameters and imaged in SEM from polymer side on a tilted stage for electron beam in a), b), c) and for X-rays in d), e). Beam parameters used are a) 5 kV b) 20 kV, 15 kV, 10 kV 3 kV, c) 5 kV for varying currents d) 526 and 536 eV alternating squares. Center one is 526 eV. e) Shallow base written at 536 eV, the higher pillars are written at 536 eV.

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