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Projects/Programs

Displaying 51 - 54 of 54

Spectrophotometry

Ongoing
NIST uses spectrophotometric techniques to measure the optical properties of materials for dissemination of national measurement scales to its stakeholders and advancing the development of standards, measurement methods, and modeling capabilities. The beneficiaries of these activities include the

Theory of the optical properties of materials

Ongoing
Around 1998, first-principles calculation of optical constants and dielectric response began to include excitonic effects. Beginning with simple, wide-gap insulators and semiconductors, the field has progressed to studying more complex materials, clusters, and so forth. In the area of core

Transfer and working standard radiometers and photometers

Ongoing
Reflectance-type silicon trap-detectors – Silicon trap-detectors have been developed for use as transfer standards for the IR-SIRCUS and IR-Laser Scatter and Detector Characterization facilities. They are built using either Hamamatsu S6337 or S1337 photodiodes. UV silicon trap-detectors have also

Waveform Metrology Project

Ongoing
Optical measurement techniques: NIST uses the electro-optic sampling (EOS) technique to measure the vector response of photodiodes and provide phase traceability for commercial instrumentation, such as large-signal network analyzers, lightwave component analyzers, vector signal analyzers