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Projects/Programs

Topic Area
Displaying 401 - 425 of 1639

Diffraction effects in radiometry

Ongoing
Essentially, classical radiometry relies on geometrical optics (to relate source radiance), geometrical aspects of an optical layout, and the irradiance at the detector. One considers the propagation of radiation from points on the surface of the source to points on the surface of the detector. In

Diffraction Metrology and Standards

Ongoing
Diffraction techniques can provide data on a number of sample characteristics. Therefore, the method of certification and the artifact itself are chosen to address a specific measurement issue pertinent to a diffraction experiment. NIST diffraction SRMs may be divided into five groups: Line Position

Digital Forensics

Ongoing
The project team develops tools for testing computer forensic software, including test criteria and test sets. ITL also maintains the National Software Reference Library – a vast archive of published software applications that is an important resource for both criminal investigators and historians.

Digital PCR

Ongoing
With appropriately validated assays, digital polymerase chain reaction (dPCR) determines the number of DNA targets (copies) per reaction partition, without the need for a standard curve. Reaction partitions can be in the form of fixed chambers in a microfluidic device, referred to as chamber digital

Digital Thread for Manufacturing

Ongoing
Purpose and Goals This project will provide research advances in product-definition standardization, conformance testing, and cybersecurity of data assets. Digital thread standards capabilities and infrastructure - Smart connected manufacturing requires the effective communication of the product

Digital Thread for Smart Manufacturing

Completed
Objective: The Digital Thread for Smart Manufacturing Systems project will deliver methods and protocols that extend and complete the digital thread for information running through design, manufacturing and product support processes to integrate smart manufacturing systems. The results of this

Digital Twins for Advanced Manufacturing

Ongoing
Objective To provide measurement science and open standards to help manufacturers better define, measure, analyze, and control advanced manufacturing systems using digital twins and enable a marketplace for digital twin users and technology providers. Technical Idea This Digital Twins for Advanced

Digital Video Exchange Standards

Ongoing
NIST is working to develop a data export standard in conjunction with the stakeholder community. The goal of standardization is to increase evidentiary value and timeliness of CCTV video data; and to facilitate interoperable data sharing between CCTV/DVR owners and Law Enforcement; as well as among

Dimensional Measurement Services

Ongoing
The Dimensional Measurement Services project promotes manufacturing innovation and U.S. industrial competitiveness by providing critical technology-enabling high accuracy dimensional measurements within an internationally accepted quality system. These measurements span the dimensional metrology

Dimensional Metrology for Nanoscale Patterns

Completed
Dimensional metrology and control is a critical component of semiconductor fabrication. State-of-the-art integrated circuits are comprised of nearly a billion nanoscale transistors linked together by an equally as impressive nanoscale network of conductors, insulators, and capacitors. To ensure that

Directed Self Assembly of Block Copolymers for Nanopatterning

Ongoing
One of the key issues for DSA is the three dimensional structure of the block copolymer. For the example of line-space patterns made using lamella-forming block copolymers, it is possible to have the DSA form tilted lamella or complex mixed morphologies that are a combination of vertical and

Directed Self-Assembly of Block Copolymers (Archived)

Completed
Diblock copolymers are long molecular chain polymers with two (di) regions, or blocks, of dissimilar monomers. They are constructed by covalently linking two different polymer chains at their ends. The two regions can be chosen so that they repel each other. Normally mixtures of different polymers

Directional Routing Protocols for Ad-hoc Networks

Completed
In wireless ad-hoc networks smart antenna techniques, capable of providing spatial reuse, longer ranges, interference suppression and other beneficial features, have been investigated to improve achievable performance and system capacity. Most works in current open literature focus on the design and

Disaster and Failure Studies & Disaster Metrology Studies

Completed
Objective - To provide leadership, coordination, and management for (1) the conduct of disaster and failure studies, including the development and maintenance of an archival data repository, (2) promoting the implementation of recommendations from disaster and failure studies, (3) carrying out the

I++ DME (Dimensional Measurement Equipment)

Completed
Industry Impact Adoption of I++ DME by a majority of vendors worldwide with compliant apps has been largely achieved due to Strong end user and CMM vendor support through groups such as I++ group, NIST, Dimensional Metrology Standards Consortium, International Association of CMM Manufacturers, and

DNA Mixture Interpretation

Ongoing
Interlaboratory Studies Mixture interlaboratory studies provide a means to assess a laboratory's ability to process and interpret DNA mixtures. Initial ‘Mixed Stain’ studies (published in 2001) provided physical samples for DNA profiling with the first commercial STR typing tests. Later, mixture

DNA Origami for Precise Manufacturing of Nanoscale Structures

Completed
The base pairing of adenine to thymine and guanine to cytosine to form DNA provides a robust molecular recognition scheme that can be used to create a wide variety of well-ordered nanostructures. DNA origami, which uses a long scaffold strand folded together by specific sets of short staple strands

DNA Technical Leader Survey

Ongoing
Please click here to start the survey The survey is now live and will close on June 17, 2022 (deadline has been extended). It is open to both U.S. and international agencies. It is to be completed by one person from each DNA laboratory – the Technical Leader (or equivalent). Frequently Asked

Documentary Standards: ANSI/IEEE N42.42 Standard

Completed
The ANSI/IEEE N42.42 standard specifies the XML data format that shall be used for both required and optional data to be made available by radiation measurement instruments. The performance requirements for these types of instruments are described in other standards. The output from these

Documentary Standards: IEC 62755 Standard N42 Data Format

Ongoing
The IEC 62755 standard specifies the XML data format that shall be used for both required and optional data to be made available by radiation measurement instruments. The performance requirements for these types of instruments are described in other IEC standards. The output from these instruments

Documentary Standards: Radiation Detection Documentary Standards Program

Ongoing
NIST leads and participates in the development and revision of documentary ANSI/IEEE (ANSI N42 standards currently transitioning to IEEE IMS TC 45 committee) and IEC (TC 45 WG B15 committee) standards that provide requirements and test methods for instruments used for the detection of illicit

Documentary Standards: X-ray Security Screening Applications

Ongoing
This work fills well-documented gaps in transportation security, which have been highlighted in Executive and Legislative requirements for 100 % screening of baggage, cargo, and airline passengers. This is accomplished through a corpus of new standards, test methods, test artifacts, dosimetry

Drug Analysis - Opioids and Emerging Threats

Ongoing
Package Interdiction Many synthetic opioids and novel psychoactive substances enter the country through international mail. Research in this area focuses on measurement challenges associated with detection and analysis of these packages at the point of seizure in international mail facilities

DUV/EUV Nanoscopy for Imaging Nanostructures

Ongoing
Novel optical nanoscopy techniques using deep-ultraviolet (DUV) and extreme-ultraviolet (EUV) laser sources are developed to characterize nanostructures with high dimensional sensitivity and low uncertainty for advancing the semiconductor devices manufacturing process. The illumination beam is