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NanoFab Tool: Nanonex NX-2000 Nanoimprint Lithography (NIL) System
The Nanonex NX-2000 Nanoimprinter provides users with the capability to replicate surface patterns with feature sizes down to 10 nm over large areas at a low cost. The tool supports both thermal and ultra-violet (UV) curing NIL processes. The NanoFab provides standard recipes for patterning various NIL resists on substrates ranging from 150 mm diameter wafers down to small pieces.
Specifications/Capabilities
- Nitrogen cushion uniformly presses the mold and substrate together, ensuring uniform patterning.
- Selectable imprint temperature range: 20 °C to 300 °C.
- Capable of patterning both UV-curable and thermoplastic resists.
- Minimum feature size: 10 nm.
Usage Information
Supported Sample Sizes
- Maximum wafer diameter: 150 mm (6 in).
- Small pieces supported: Yes.
- Maximum substrate thickness: 5 mm.
Typical Applications
- Polymer and sol-gel surface patterning.
- Nanoscale device fabrication.
- Studying polymer properties at the nanoscale.