Tools and Instruments

Displaying 1 - 25 of 92

Aberration-Corrected Transmission Electron Microscope (TEM)

Probe corrected 200kV analytic electron microscope Resolves single atoms Chemical analytic capability (EELS, EDS) Highest resolution in electron optics (<0.1 nm

Photograph of the 4Wave IBD/BTD cluster sputtering system

NanoFab Tool: 4Wave IBD/BTD Cluster Sputter Deposition System

The 4Wave IBD/BTD cluster sputter deposition system can automatically load and unload two six target chambers to provide users a largely unattended 24/7

Photograph of the Allied High Tech Dual Prep PH-3 grinding and polishing system.

NanoFab Tool: Allied High Tech Dual Prep PH-3 Grinding and Polishing System

The Allied High Tech Dual Prep PH-3 grinding and polishing system is used to mechanically thin samples and polish cleaved facets in preparation for high

NanoFab Tool: Bachur & Associates LS-200FSX Photoresist Stabilization System

The Bachur & Associates LS-200FSX Photoresist Stabilization System provides deep-ultraviolet (DUV) flood exposure and resist curing. The system strengthens

NanoFab Tool: Bruker Dektak 6M contact profilometer

The Bruker Dektak 6M contact profilometer measures the thickness of patterned thin films by sensing the deflections of a fine stylus riding over feature steps

Photograph of the Bruker Dimension FastScan Atomic Force Microscope.

NanoFab Tool: Bruker Dimension FastScan Atomic Force Microscope

The Bruker Dimension FastScan atomic force microscope (AFM) combines a high-speed scanning AFM, programmable stage control, and a user friendly interface to

NanoFab Tool: Denton Vacuum Discovery 550 Sputtering System B104 Right

The Denton Vacuum Discovery 550 sputtering system has two direct current (DC) and two radio frequency (RF) sputtering guns which bombard targets, causing atoms

NanoFab Tool: Denton Vacuum Discovery 550 Sputtering System B104 Left

The Denton Vacuum Discovery 550 sputtering system has two direct current (DC) and two radio frequency (RF) sputtering guns which bombard targets, causing atoms

NanoFab Tool: Denton Vacuum Infinity 22 Electron Beam and Thermal Evaporator

The Denton Vacuum Infinity 22 dual source evaporator uses a choice of either electron beam evaporation or resistive heating to vapor deposit thin films

Photograph of the Denton Vacuum Infinity 22 evaporator.

NanoFab Tool: Denton Vacuum Infinity 22 Electron Beam Evaporator

The Denton Vacuum Infinity 22 electron beam evaporator vapor deposits thin films and is capable of loading up to six source materials for deposition. The

NanoFab Tool: Ecopia Hall Effect Measurement System

The HMS-5500 Hall Effect measurement system is used to measure electrical resistivity, carrier density, and mobility of semiconducting materials. The system is

NanoFab Tool: FEI Helios NanoLab 660 Dual Beam Scanning Electron Microscope (SEM) and Focused Ion Beam (FIB) 2

The FEI Helios 660 dual-beam microscope combines a monochromated field emission scanning electron microscope (FE-SEM) with an advanced focused ion beam (FIB)

Photograph of the FEI Titan 80-300 analytical electron microscope.

NanoFab Tool: FEI Titan 80-300 Analytical Transmission Electron Microscope

The FEI Titan 80-300 scanning transmission electron microscope (STEM) is an advanced analytical field emission scanning transmission electron microscope capable

NanoFab Tool: Filmetrics F50 UV Mapping Reflectometer

The Filmetrics F50 is an automated thin-film thickness mapping system equipped with a motorized r-theta stage that moves automatically to selected measurement

NanoFab Tool: First Ten Angstroms FTA125 Contact Angle Goniometer

The First Ten Angstroms FTA125 is a general purpose goniometer that can measure the contact angle and surface tension of liquid droplets on a substrate's

Photograph of the Fischione Model 1040 NanoMill.

NanoFab Tool: Fischione Model 1040 NanoMill Ion Mill

The Fischione Model 1040 NanoMill is a low-energy, low-angle argon ion milling instrument used for preparing ultra-thin, high-quality transmission electron

NanoFab Tool: Four Dimensions 280DI Sheet Resistance Mapping System

The Four Dimensions 280DI sheet resistance mapping system uses the 4-point probe technique to measure the sheet resistance of substrates and films. The

Photograph of the Heidelberg Instruments DWL 2000 Laser Pattern Generator.

NanoFab Tool: Heidelberg Instruments DWL 2000 Laser Pattern Generator

The Heidelberg Instruments DWL 2000 Laser Pattern Generator uses a high resolution laser to expose photoresist for substrate patterning of features as small as

NanoFab Tool: IPEC 472, Chemical Mechanical Polisher (CMP)

The CMP removes material both chemically, by use of a corrosive colloidal slurry, and mechanically, by way of a wafer carrier under controlled pressure rotating

NanoFab Tool: J. A. Woollam M-2000 DI Spectroscopic Ellipsometer

The J. A. Woollam M-2000 DI spectroscopic ellipsometer provides fast and accurate thin film characterization over a wide spectroscopic range. The high speed CCD

NanoFab Tool: Jeio Tech OF-12G Forced Convection Oven

The Jeio Tech OF-12G forced convection oven is used in the soft lithography processing to perform a dehydration bake prior to silanization and cure samples

NanoFab Tool: JEOL JBX 6300-FS Direct Write Electron Beam Lithography System (Cleanroom)

The JEOL JBX 6300-FS direct write electron beam lithography system allows users to quickly and directly pattern a variety of substrate materials with features

NanoFab Tool: Keithley 4200 SCS Parametric Test Station

The Keithley 4200 SCS parametric test system provides in-line electrical characterization capabilities, including the ability to measure capacitance at multiple

Photograph of the Kulicke and Soffa Model 4526 wedge wire bonder.

NanoFab Tool: Kulicke and Soffa Model 4526 Wedge Wire Bonder

The Kulicke and Soffa Model 4526 wedge wire bonder provides electrical interconnects between a device chip and package using thin aluminum or gold wires. The

NanoFab Tool: Microprocess Technology Avenger Spray Solvent Lift-off Tool

The Microprocess Technology Avenger spray solvent lift-off tool uses a heated spray solvent to remove residual material and photoresist after deposition of a