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Metrology

Electrical / electromagnetic metrology

News and Updates

Projects and Programs

Measuring Intermolecular Interactions with Electro-Acoustic Spectroscopy

Ongoing
We have a number of opportunities to collaborate with us. See below for details. What does this project aim to do for the chemical industry? Many industrial processes depend on the intermolecular environment- the solvents and ions that surround a molecule. These interactions impact separations
Small array of transistors designed for single device integration.

Integrated CMOS Testbeds for Nanoelectronics and Machine Learning

Ongoing
The increasingly complex device requirements for next-generation computing architectures such as neuromorphic computing or nanoelectronic machine learning accelerators present challenges for researchers across the spectrum of institutions, from small businesses and universities to government

Advanced Materials Metrology

Ongoing
Electromagnetic devices cannot operate without the interaction of electromagnetic waves with materials, and the characterization of the interface between fields and materials will be a critical task for any device or metrology development from nanoscale to larger scales. Areas of impact over the

Publications

VHF Josephson Arbitrary Waveform Synthesizer

Author(s)
Jeremy Thomas, Nathan Flowers-Jacobs, Anna Fox, Akim Babenko, Samuel Benz, Paul Dresselhaus
We report on the design, fabrication, and measurement of a Very High Frequency band Josephson Arbitrary Waveform Synthesizer (VHF-JAWS) at frequencies up to 50

Statistical study and parallelization of multiplexed single-electron sources

Author(s)
S Norimoto, P See, N Schoinas, I Rungger, Tommy Boykin, Michael Stewart, J. P. Griffiths, C. Chen, D. A. Ritchie, M. Kataoka
Increasing electric current from a single-electron source is a main challenge in an effort to establish the standard of the ampere defined by the fixed value of

Tools and Instruments

MBE Facility

Molecular Beam Epitaxy (MBE) Facility

The Applied Physics Division utilizes a fully automated, dual-chamber molecular beam epitaxy (MBE) system for the growth of advanced, compound semiconductor