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Physics

Electron physics

News and Updates

Projects and Programs

Reflectance of two materials

Extreme ultraviolet optical constants

Ongoing
Measurements of EUV optical constants are often made by measuring the absorption or near-normal-incidence reflectivity, then performing transforms to obtain both the real and imaginary parts of the index. These sorts of measurements have considerable uncertainty because they require knowledge of
A 3" wafer is seen concentric with the lower plasma electrode.

Precision Materials for Quantum Devices

Ongoing
MBE System Our fabrication system is composed of ultra-high vacuum (UHV) chambers that support the in-vacuum exchange of 75 mm wafers without exposure to air as seen in Figure 1. These chambers are: (1) a deposition chamber with electron gun deposition, UHV compatible sputter guns, in situ shadow
silicon photodiode

Extreme Ultraviolet Detector Calibration Service

Ongoing
The National Institute of Standards and Technology (NIST) has a wide variety of programs for the calibration of instruments and components for space-based research in the extreme ultraviolet (EUV). Many of these programs have been in existence since the 1960s, and have provided calibration support

Publications

Statistical study and parallelization of multiplexed single-electron sources

Author(s)
S Norimoto, P See, N Schoinas, I Rungger, Tommy Boykin, Michael Stewart, J. P. Griffiths, C. Chen, D. A. Ritchie, M. Kataoka
Increasing electric current from a single-electron source is a main challenge in an effort to establish the standard of the ampere defined by the fixed value of

Software

HolograFREE

An electron hologram is a fringe modulated image containing the amplitude and phase information of an electron transparent object. The HolograFREE routines

Tools and Instruments

Beamline 7

Beamline 7: EUV reflectometry

The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then