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Stephanie Moffitt (Fed)

Physicist

Stephanie Moffitt is a researcher in the Optical Radiation Group of the Sensor Science Division. Her current research is focused on developing metrology for semiconductor technology as part of the Synchrotron Ultraviolet Radiation Facility (SURF III). This work includes characterizing EUV optics durability, calibration of EUV detectors, improving metrology for EUV sources, and development of EUV scatterometry and spectroscopic ellipsometry.

Stephanie began using synchrotron light sources to study oxide materials while getting B.S. in Chemistry from the University of California at Santa Barbara. This led her to Northwestern University where she studied the relationships of structure, property, and performance of amorphous oxide semiconductors. After getting her Ph.D. in Materials Science and Engineering, Dr. Moffitt began studying solar panel materials reliability, specializing in synchrotron-based characterization methods at SLAC National Accelerator Laboratory and the Stanford Synchrotron Radiation Lightsource. In 2019, she joined NIST as a National Research Council postdoctoral fellow.

For a full list of publications, please visit Dr. Moffitt’s Google Scholar Page

Awards

  • Special Act Award, NIST Engineering Laboratory, for outstanding performance in the organization and execution of critical tasks to support the NCST investigation into the collapse of the Champlain Towers South condominium building (2022)
  • Research Associateship Program Fellowship, National Research Council/NIST (2019)
  • Graduate Research Fellowship, National Science Foundation (2013)

Publications

PVDF-based Backsheet Cracking: Mapping In Situ Phase Evolution by X-ray Scattering

Author(s)
Stephanie Moffitt, Sona Ulicna, Song-Syun Jhang, Po-Chang Pan, Michael Owen-Bellini, Peter Hacke, Michael Kempe, Jared Tracy, Kaushik Choudhury, Laura Schelhas, Xiaohong Gu
One of the most common polymers in commercial photovoltaic (PV) backsheets is polyvinylidene fluoride (PVDF). However, recent reports have shown the potential

NIST efforts in extreme-ultraviolet metrology

Author(s)
Charles S. Tarrio, Steven Grantham, Rob Vest, Thomas A. Germer, Bryan Barnes, Stephanie Moffitt, Brian Simonds, Matthew Spidell
For several decades, the National Institute of Standards and Technology (NIST) has actively supported metrology programs for extreme ultraviolet (EUV)
Created October 10, 2019, Updated April 1, 2025