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NanoFab Tool: AllWin21 Downstream Asher
The AllWin21 Downstream plasma asher uses heat and exposure to downstream oxygen radicals to remove resist and other organic materials. The cassette load system is capable of handling 100 mm (4 in) diameter substrates.
Specifications/Capabilities
- Fixed 1000 W 2.4 GHz Radio frequency (RF) power source.
- Unique process gases: O2 and CF4
- Downstream ashing of resist.
Usage Information
Supported Sample Sizes
- Maximum wafer diameter: 100 mm (4 in).
- Small pieces supported: yes
Typical Applications
Created May 5, 2022, Updated November 30, 2023