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PUBLICATIONS

Localization Microscopy for Process Control in Nanoelectronic Manufacturing

Published

Author(s)

Craig R. Copeland, Ronald G. Dixson, Andrew Madison, Adam L. Pintar, Robert Ilic, Samuel M. Stavis
Proceedings Title
The 2022 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN)
Conference Dates
June 20-23, 2022
Conference Location
Monterey, CA, US
Pub Type
Conferences

Download Paper

Local Download
Reference materials, Optical / photometry / laser metrology and Dimensional metrology

Citation

Copeland, C. , Dixson, R. , Madison, A. , Pintar, A. , Ilic, R. and Stavis, S. (2022), Localization Microscopy for Process Control in Nanoelectronic Manufacturing, The 2022 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) , Monterey, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=934055 (Accessed December 17, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created June 20, 2022, Updated November 29, 2022