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Optical / photometry / laser metrology

News and Updates

Projects and Programs

NIST Automated Vehicles Program

Ongoing
Measurement science and standards are needed to support the safe and predictable operation of future automated vehicles (AVs), which have great potential to significantly impact our daily lives and improve the competitiveness of our economy. A FY22 NIST Strategic and Emerging Research Initiatives

Quantitative Information from Images

Ongoing
Projects: Quantifying Amount of Material through Light Measurement Fluorescence and Luminescence Imaging for Surgical Guidance Fluorescence-guided imaging devices are being used for navigation in minimally invasive surgical procedures to increase a patient’s positive clinical outcomes and shorten

Metrology of Dim Light Sources

Ongoing
“What is the lowest amount of light that this instrument can detect?” is an important yet unmet measurement challenge. Evaluating the detection performance of complicated imaging instruments is crucial to quantifying substances of interest and the ability to compare results across instruments

Optical Radiation Metrology and Standard Radiometers

Ongoing
Radiometric, radiance temperature, photometric, and color scales have been realized based on the spectral responsivity of standard detectors and radiometers. These reference responsivity scales have been transferred to other NIST calibration facilities to realize and maintain these detector-based

Publications

Wavemeter calibration by frequency comb

Author(s)
Patrick Egan
Upgrades to the vacuum-wavelength calibration service at NIST are reported. The instrumentation centerpiece is an optical frequency comb tied to a GPS

Software

JB95 Spectral fitting program

A graphical user interface program, JB95, based on a Windows 95 © API platform has been written in the C programming language to aid in the analysis of complex

Tools and Instruments

Beamline 7: EUV reflectometry

The NIST/DARPA EUV Reflectometry facility began in the late 1980's to make measurements of the reflectivity of EUV multilayer optics for lithography. Since then

Awards