Postek, M.
, Larrabee, R.
and Keery, W.
(1989),
An approach to accurate x-ray mask measurements in a scanning electron microscope:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.89-4047
(Accessed November 8, 2024)
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An approach to accurate x-ray mask measurements in a scanning electron microscope:
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- NIST IR 89-4047
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NIST IR 89-4047
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Created January 1, 1989, Updated May 20, 2023