Sobolewski, M.
(2006),
Effects of Wafer Impedance on the Monitoring and Control of Ion Energy in Plasma Reactors, Journal of Applied Physics
(Accessed March 13, 2025)
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Effects of Wafer Impedance on the Monitoring and Control of Ion Energy in Plasma Reactors
Published
Author(s)
Citation
Journal of Applied Physics
Volume
100
Issue
6
Pub Type
Journals
Citation
Issues
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Created September 15, 2006, Updated February 17, 2017