Chi, P.
(1998),
Anomalies in Shallow Depth Profiles of Boron in Silicon, Secondary Ion Mass Spectrometry SIMS XI, Orlando, FL
(Accessed March 19, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Anomalies in Shallow Depth Profiles of Boron in Silicon
Published
Author(s)
Proceedings Title
Secondary Ion Mass Spectrometry SIMS XI
Volume
11
Conference Dates
September 7-12, 1997
Conference Location
Orlando, FL
Conference Title
11th International Conference on Secondary Ion Mass Spectrometry (SIMS XI)
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created February 1, 1998, Updated February 19, 2017