Tanenbaum, D.
, Laracuente, A.
and Gallagher, A.
(1997),
Surface roughening during plasma enhanced chemical-vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates, Physical Review B (Condensed Matter and Materials Physics)
(Accessed November 8, 2024)
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Surface roughening during plasma enhanced chemical-vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates
Published
Author(s)
D M. Tanenbaum, A L. Laracuente, A Gallagher
Citation
Physical Review B (Condensed Matter and Materials Physics)
Volume
56
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 1997, Updated February 17, 2017