Sauvageau, J.
, Booi, P.
, Cromar, M.
, Benz, S.
, Burroughs, C.
and Koch, J.
(1995),
Superconducting Integrated Circuit Fabrication Process Utilizing Low Temperature ECR-Based PECVD SiO<sub>2</sub> Dielectric Films, IEEE Transactions on Applied Superconductivity
(Accessed July 18, 2024)
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Superconducting Integrated Circuit Fabrication Process Utilizing Low Temperature ECR-Based PECVD SiO2 Dielectric Films
Published
Author(s)
J. E. Sauvageau, P. A. Booi, M. W. Cromar, , ,
Citation
IEEE Transactions on Applied Superconductivity
Volume
5
Issue
2
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created May 31, 1995, Updated October 12, 2021