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Nanoporous Ultralow Dielectric Constant Organosilicates Templated by Triblock Copolymers

Published

Author(s)

S Y. Yang, V. J. Lee, J N. Sun, D W. Gidley, P A. Mirau, C S. Pai, O Nalamasu, E Reichmanis, J C. Pai, Yaw S. Obeng, J Seputro, Eric K. Lin
Citation
Chemistry of Materials
Volume
14(1)

Keywords

Dielectric Properties, Electronic Materials, Mechanical Properties, Nanostructured Materials, Reflectivity, Scattering, Thin Films, low-k dielectric, nanoporous thin film, organosilicate, positronium annihiliation lifetime spect, small angle neutron scattering, triblock copolymers, x-ray reflectivity

Citation

Yang, S. , Lee, V. , Sun, J. , Gidley, D. , Mirau, P. , Pai, C. , Nalamasu, O. , Reichmanis, E. , Pai, J. , Obeng, Y. , Seputro, J. and Lin, E. (2002), Nanoporous Ultralow Dielectric Constant Organosilicates Templated by Triblock Copolymers, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853817 (Accessed July 18, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2001, Updated October 12, 2021