Potzick, J.
(1998),
Accuracy Differences Among Photomask Metrology Tools--and Why They Matter, 18th Annual SPIE/BACUS Symposium on Photomask Technology and Management
(Accessed January 2, 2025)
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Accuracy Differences Among Photomask Metrology Tools--and Why They Matter
Published
Author(s)
Abstract
A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput, footprint, etc. But how do their potential accuracies differ, and is this important? In this context the effects of tool resolution, the meaning of measurement accuracy and traceability, the role of standards, and how these fit into the measurement model and affect manufacturing profitability are discussed. These considerations can help in choosing the right tool for the measurement task at hand and in evaluating the measurement results.Proceedings Title
18th Annual SPIE/BACUS Symposium on Photomask Technology and Management
Conference Dates
September 1, 1998
Conference Title
Symposium on Photomask Technology and Management
Pub Type
Conferences
Keywords
accuracy, metrology, photomask, resolution, traceability
Citation
Issues
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Created September 1, 1998, Updated February 19, 2017