Myers, D.
, Vawter, G.
, Jones, G.
, Zipperian, T.
, Drummond, T.
, Fritz, I.
, Dawson, L.
, Brennan, T.
, Hammons, B.
, Datye, A.
, Simons, D.
and Comas, J.
(1992),
Rapid-Thermal Annealing for Quantum-Well Heterostructure Device Fabrication, IEEE Transactions on Electron Devices
(Accessed July 17, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Rapid-Thermal Annealing for Quantum-Well Heterostructure Device Fabrication
Published
Author(s)
Daryl Myers, G. A. Vawter, G A. Jones, T. E. Zipperian, T. J. Drummond, I. J. Fritz, L. R. Dawson, T. M. Brennan, B. E. Hammons, A. K. Datye, , J. Comas
Citation
IEEE Transactions on Electron Devices
Volume
39
Issue
1
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1991, Updated October 12, 2021