Simons, D.
, Chi, P.
and Novotny, D.
(1991),
Evidence From SIMS of Doubly-Charged Boron Contamination During Singly-Charged Ion Implantation, Proc., 12th International Congress for Electron Microscopy, Seattle, WA, USA
(Accessed July 17, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Evidence From SIMS of Doubly-Charged Boron Contamination During Singly-Charged Ion Implantation
Published
Author(s)
, , Donald B. Novotny
Proceedings Title
Proc., 12th International Congress for Electron Microscopy
Conference Location
Seattle, WA, USA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 30, 1991, Updated October 12, 2021