Daniel Sunday

Research Interests

Soft x-ray scattering and reflectivity for structure and orientation in thin films
Block copolymer directed self-assembly and lithography
Block copolymers with alternative architectures
Photoresist chemistry and processing
Properties of polymers under confinement and in thin films

Awards

NRC Postdoctoral Fellowship, 2011

Department of Commerce Bronze Medal, 2016

Department of Commerce Gold Medal, 2018

Selected Publications

Reducing Block Copolymer Interfacial Widths through Polymer Additives

February 10, 2015

Author(s)

Daniel F. Sunday, Regis J. Kline

There is a need to design new materials to achieve smaller pitches and reduced interfacial widths for use in the nanopatterning of block copolymers (BCPs). One

Determination of the shape and periodicity of nanostructures through variable angle transmission small angle x-ray scattering

October 15, 2015

Author(s)

Daniel F. Sunday, Regis J. Kline, Scott List, Jasmeet Chawla

Confinement and Processing Can Alter the Morphology and Periodicity of Bottlebrush Block Copolymers in Thin Films

December 22, 2020

Author(s)

Daniel Sunday, Moshe Dolejsi, Alice B. Chang, Lee J. Richter, Ruipeng Li, Paul Nealey, Robert H. Grubbs

Bottlebrush block copolymers (BBCPs) are intriguing architectural variations on linear BCPs with highly tunable structure. Conﬁnement can have a signiﬁcant

Composition Dictates Molecular Orientation at the Heterointerfaces of Vapor-Deposited Glasses

June 23, 2023

Author(s)

Thomas Ferron, Marie Fiori, Mark Ediger, Dean DeLongchamp, Daniel Sunday

Physical vapor deposition (PVD) can prepare organic glasses with a preferred molecular orientation. The relationships between deposition conditions and

The Relationship between Grafting Density and the Solution Structure of Polynorbornene Bottlebrush Polymers

September 14, 2023

Author(s)

Daniel Sunday, Adam Burns, Tyler Martin, Alice Chang, Robert Grubbs

Developing an understanding of the relationships between structure and conformation in complex macromolecular architectures is key for designing materials with

Publications

Instrument Development for Spectroscopic Ellipsometry and Diffractometry in the EUV

April 24, 2024

Author(s)

Stephanie Moffitt, Bryan Barnes, Thomas A. Germer, Steven Grantham, Eric Shirley, Martin Sohn, Daniel Sunday, Charles S. Tarrio

Semiconductor devices are noted for ever-decreasing dimensions but now are also becoming more complex. While scanning probe microscopy can still resolve the

Self-Assembly of Hierarchical High-χ Fluorinated Block Copolymers with an Orthogonal Smectic-within-Lamellae 3 nm Sub-Lattice and Vertical Surface Orientation

April 16, 2024

Author(s)

Bijal Patel, Hongbo Feng, Whitney Loo, Chad R. Snyder, Christopher Eom, Julia Murphy, Daniel Sunday, Paul Nealey, Dean DeLongchamp

Hierarchical structure-within-structure assemblies offer a route toward increasingly complex and multifunctional materials while pushing the limits of block

The Relationship between Grafting Density and the Solution Structure of Polynorbornene Bottlebrush Polymers

September 14, 2023

Author(s)

Daniel Sunday, Adam Burns, Tyler Martin, Alice Chang, Robert Grubbs

Developing an understanding of the relationships between structure and conformation in complex macromolecular architectures is key for designing materials with

Composition Dictates Molecular Orientation at the Heterointerfaces of Vapor-Deposited Glasses

June 23, 2023

Author(s)

Thomas Ferron, Marie Fiori, Mark Ediger, Dean DeLongchamp, Daniel Sunday

Physical vapor deposition (PVD) can prepare organic glasses with a preferred molecular orientation. The relationships between deposition conditions and

Defining Chi for Block Copolymer Lithography

January 11, 2023

Author(s)

Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey

Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength

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Patents (2018-Present)

Determining Tilt Angle In Patterned Arrays Of High Aspect-Ratio Structures By Small-Angle X-Ray Scattering

NIST Inventors

Wen-Li Wu , Daniel Sunday and R Joseph Kline

Provided herein are methods and apparatus for characterizing high aspect ratio (HAR) structures of fabricated or partially fabricated semiconductor devices. The methods involve using small angle X-ray scattering (SAXS) to determine average parameters of an array of HAR structures. In some

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Daniel Sunday (Fed)

Research Interests

Awards

Selected Publications

Publications

Patents (2018-Present)