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Nanotechnology /Nanofabrication / manufacturing

Lithography

News and Updates

Projects and Programs

Three-dimensional view of carbon nanostructures grown on the surface of a glass fiber

Electron Microscopy of Carbon Nanotube Composites

Ongoing
Multi-wall CNTs (MWCNTs) are a common nano-carbon reinforcement material and are frequently dispersed into a polymer matrix to form composites that can be engineered with specific combinations of desirable properties – electrical, thermal, optical and mechanical, etc. However, this

Polymers for Next-Generation Lithography

Completed
We work closely with the semiconductor industry to develop and apply measurements with high-spatial and chemically-specific resolution to elucidate the critical materials properties and process kinetics at nanometer scales that are needed to advance next-generation photolithography, including both

Metrology for Nanoimprint Lithography

Completed
Nanoimprint Lithography (NIL) was originally perceived as a versatile, low-cost, and high-resolution patterning alternative for optical lithography in CMOS fabrication. However, it is becoming apparent that NIL has great potential for nanotechnology in general. It is capable of patterning sub-10 nm

Publications

Defining Chi for Block Copolymer Lithography

Author(s)
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength

PHIDL: Python-based layout and geometry creation for nanolithography

Author(s)
Adam McCaughan, Alexander N. Tait, Sonia Buckley, Jeff Chiles, Jeff Shainline, Sae Woo Nam, Dylan M. Oh
Computer-aided design (CAD) has become a critical element in the creation of nanopatterned structures and devices. In particular, with the increased adoption of

Tools and Instruments