Jonathan Wyrick is an experimental physicist at the National Institute of Standards and Technology (NIST) in the Atom Scale Device Group. He performs fundamental research developing the chemical physics of bottom-up fabricated artificial structures embedded in silicon. Technical thrusts of this work include: 1) the study of artificial molecules constructed from silicon dangling bonds and their interactions with deposited atoms/molecules, 2) development of low temperature atom/molecule manipulation with a scanning tunneling microscope (STM), 3) using low-temperature manipulation to build dopant-based arrays for analog quantum simulation and dopant-based qubits for quantum computing, 4) developing feedback control, automation and semi-automation protocols for atomic manipulation and lithography techniques to do more efficient atom-scale device fabrication, 5) development of new techniques to place different dopants on Si and to fabricate atom-scale dopant clusters designed as qubits, quantum sensors or quantum memories, and 6) specialized in situ measurements for characterization of atom/molecule-based devices. Jonathan graduated from the University of California, Riverside with a Ph.D. in Physics and received two undergraduate degrees: the first in Mathematics and Computer Science from Furman University, and the second in Physics from James Madison University.