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PUBLICATIONS

Atomic Level Surface Metrology

Published

Author(s)

Theodore V. Vorburger, Ronald G. Dixson, Jun-Feng Song, Thomas Brian Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger

Abstract

MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with rms roughness 0.1 nmSilicon gate oxides with thickness 3 nm,rms roughness must be significantly smaller to minimizevariation in the gate oxide
Conference Dates
November 26-27, 2001
Conference Location
Unknown, 1, USA
Conference Title
Defense Manufacturing Conference
Pub Type
Conferences

Keywords

Calibration Methods, Silicon Atomic Steps, Surface Finish Metrology
Metrology and Manufacturing

Citation

Vorburger, T. , Dixson, R. , Song, J. , Renegar, T. , Fu, J. , Orji, N. , Tsai, V. , Williams, E. , Edwards, H. , Cook, D. , West, P. and Nyffenegger, R. (2001), Atomic Level Surface Metrology, Defense Manufacturing Conference, Unknown, 1, USA (Accessed January 15, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2000, Updated October 12, 2021