Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Controlled Synthesis of Single-Crystalline InN Nanorods

Published

Author(s)

Igor Levin, Albert Davydov, O M. Kryliouk, Hyun Jong Park, YongSun Won, T J. Anderson, J P. Kim, J A. Freitas

Abstract

Single-crystalline InN nanorods were successfully grown on c-Al203, GaN, and Si substrates by non catalytic, template-free hydride metal-organic vapor phase epitaxy (H-MOVPE). Stable gas-phase oligomer formation is proposed as the nucleation mechanism for InN nanoparticle generation. It was evaluated thermodynamically and confirmed experimentally that the growth of nanorods occurs at the growth-etch transition region. Dislocation-free high quality InN nanorods with [00.1] growth axis were formed via the solid-vapor growth mechanism. Growth parameters and optimal growth conditions were determined. The nanorods diameter, density and orientation were controlled using growth temperature, substrate selection, HCI/TMI and V/III ratios. Extensive studies of the nanorods were performed by FESEM, XRD, TEM, EDS, and Raman scattering.
Citation
Nano Letters

Keywords

growth, nanowire, nitride, semiconductor

Citation

Levin, I. , Davydov, A. , Kryliouk, O. , Park, H. , Won, Y. , Anderson, T. , Kim, J. and Freitas, J. (2017), Controlled Synthesis of Single-Crystalline InN Nanorods, Nano Letters (Accessed October 31, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created February 19, 2017