Mayo, S.
and Evans, W.
(1979),
Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.IR.78-1558
(Accessed November 8, 2024)
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Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films:
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- NBS IR 78-1558
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NBS IR 78-1558
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NIST Pubs
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Created January 1, 1979, Updated May 19, 2023