Knight, S.
(2003),
Development of Metrology at NIST For the Semiconductor Industry, Characterization and Metrology for ULSI Technology, Austin, TX, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31402
(Accessed October 31, 2024)
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Development of Metrology at NIST For the Semiconductor Industry
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Author(s)
Abstract
The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific projects addressing needs in lithography, critical dimension and overlay, gate dielectric characterization, interconnect materials, and manufacturing support. The paper will emphasize the role collaboration with industry plays in project selection, project success, and transfer to industry.Proceedings Title
Characterization and Metrology for ULSI Technology
Volume
683
Conference Dates
March 24-28, 2003
Conference Location
Austin, TX
Conference Title
2003 International Conference: Characterization and Metrology for ULSI Technology
Pub Type
Conferences
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Keywords
lithography, microelectronics, modeling, semiconductor, thin film, wafer characterization, interconnect and packaging
Citation
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Created September 1, 2003, Updated January 27, 2020