Suehle, J.
, Chaparala, P.
, Messick, C.
, Miller, W.
and Boyko, K.
(1994),
Field and Temperature Acceleration of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO<sub>2</sub>, Proc., 1994 IEEE International Reliability Physics Symposium, San Jose, CA, USA
(Accessed July 17, 2024)
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Field and Temperature Acceleration of Time-Dependent Dielectric Breakdown in Intrinsic Thin SiO2
Published
Author(s)
, P Chaparala, C. Messick, , K. C. Boyko
Proceedings Title
Proc., 1994 IEEE International Reliability Physics Symposium
Conference Dates
April 12-14, 1994
Conference Location
San Jose, CA, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1994, Updated October 12, 2021