Materer, N.
, Goodman, R.
and Leone, S.
(1997),
Laser single-photon mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100), Journal of Vacuum Science and Technology A
(Accessed November 8, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Laser single-photon mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100)
Published
Author(s)
N Materer, R S. Goodman,
Citation
Journal of Vacuum Science and Technology A
Volume
15
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1996, Updated October 12, 2021