Larson, D.
and Veasey, D.
(1992),
Localized Plasma Etching for Device Optimization, Journal of Vacuum Science and Technology
(Accessed December 26, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Localized Plasma Etching for Device Optimization
Published
Author(s)
, D. L. Veasey
Citation
Journal of Vacuum Science and Technology
Volume
10
Issue
1
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created November 30, 1992, Updated October 12, 2021