Jablonski, E.
, Sambasivan, S.
, Lin, E.
, Fischer, D.
, Devadoss, C.
and Puligadda, R.
(2003),
Near Edge X-Ray Absorption Fine Structure Measurements of the Interface between Bottom Antireflective Coatings and a Model Deprotected Photoresist, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853911
(Accessed December 26, 2024)
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Near Edge X-Ray Absorption Fine Structure Measurements of the Interface between Bottom Antireflective Coatings and a Model Deprotected Photoresist
Published
Author(s)
, S Sambasivan, , , C Devadoss, R Puligadda
Citation
Journal of Vacuum Science and Technology B
Volume
21(6)
Pub Type
Journals
Download Paper
Keywords
157 nm photoresists, Diffusion, Electronic Materials, Formulations, Lithography, NEXAFS, Spectroscopy, Thin Films, lithography, polymer blend, surface segregation, thin film
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 2003, Updated February 17, 2017