Silver, R.
, Singer, A.
, Carroll, L.
, Berg-cross, S.
and Potzick, J.
(1996),
Optical Overlay Metrology at NIST, Proceedings of KLA Microlithography Seminar, Gaithersburg, MD
(Accessed December 26, 2024)
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Optical Overlay Metrology at NIST
Published
Author(s)
, , L Carroll, S Berg-cross,
Abstract
Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standard reference materials and artifacts. We present the standards development effort at NIST and explain the unique capabilities of the new optical overlay metrology instrument.Proceedings Title
Proceedings of KLA Microlithography Seminar
Conference Dates
January 1, 1996
Conference Location
Gaithersburg, MD
Pub Type
Conferences
Keywords
optics, overlay metrology, overlay standards, stepped microcone, tool induced shift
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 1996, Updated February 19, 2017