Prabhu, V.
, Jones, R.
, Lin, E.
and Wu, W.
(2003),
Polyelectrolyte Effects in Model Photoresist Developer Solutions, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852091
(Accessed December 25, 2024)
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Polyelectrolyte Effects in Model Photoresist Developer Solutions
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Abstract
We demonstrate that the industrially relevant deprotected photoresist poly(4-hydroxy styrene) is a polyelectrolyte when dissolved in aqueous base solutions. These findings demonstrate the well-known monomer-monomer correlations indicative of polyelectrolytes as measured by small-angle neutron scattering. The correlation peak at finite wave vector is a function of solution ionic strength and polymer concentration. The weakening of the polyelectrolyte effects with added salts and excess base is also demonstrated. These studies emphasize the role of salt additives and aqueous base concentration and their influence on equilibrium solution properties such as the second virial coefficient and single chain radius of gyration. The fundamental role of these equilibrium properties with respect to the dissolution process is speculated.Citation
Journal of Vacuum Science and Technology B
Volume
21
Issue
4
Pub Type
Journals
Download Paper
Keywords
additives, neutron scattering, phase behavior, photoresist, polyelectrolyte, small-angle
Citation
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Created August 1, 2003, Updated February 19, 2017