Results of an international photomask linewidth comparison of NIST and PTB

Published

October 9, 2009

Author(s)

Bernd Bodermann, Detleff Bergmann, Egbert Buhr, Wolfgang Haebler-Grohne, Harald Bosse, James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji

Abstract

In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.

Proceedings Title

SPIE Proceedings Vol. 7488

Volume

7488

Conference Dates

September 14-17, 2009

Conference Location

Monterey, CA, US

Conference Title

SPIE/BACUS Photomask Technology Conference 2009

Pub Type

Conferences

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Keywords

linewidth, CD metrology, uncertainty components, Nano1, international comparison, MRA, photomask

Citation

Bodermann, B. , Bergmann, D. , Buhr, E. , Haebler-Grohne, W. , Bosse, H. , Potzick, J. , Dixson, R. , Quintanilha, R. , Stocker, M. , Vladar, A. and Orji, N. (2009), Results of an international photomask linewidth comparison of NIST and PTB, SPIE Proceedings Vol. 7488, Monterey, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=903776 (Accessed November 21, 2024)