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Results of an international photomask linewidth comparison of NIST and PTB
Published
Author(s)
Bernd Bodermann, Detleff Bergmann, Egbert Buhr, Wolfgang Haebler-Grohne, Harald Bosse, James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract
In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution reports on the current status of the bilateral comparison. In particular the methods for linewidth metrology applied at NIST and PTB and its major uncertainty contributions will be discussed based on actual measurements results for both of the mask standards chosen for the bilateral comparison.
Bodermann, B.
, Bergmann, D.
, Buhr, E.
, Haebler-Grohne, W.
, Bosse, H.
, Potzick, J.
, Dixson, R.
, Quintanilha, R.
, Stocker, M.
, Vladar, A.
and Orji, N.
(2009),
Results of an international photomask linewidth comparison of NIST and PTB, SPIE Proceedings Vol. 7488, Monterey, CA, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=903776
(Accessed October 11, 2025)