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Displaying 1126 - 1150 of 2125

Influence of room temperature control system on AFM imaging

October 1, 2009
Author(s)
Joseph Fu, Wei Chu, Theodore V. Vorburger
As technology progresses, the control of environment for experiments is also getting more sophisticated; such as the control of lab temperature and vibration. Temperature controlled within ± 0.25° C for a general purpose lab is common place. We illustrate

The Dimensional Markup Language Specification for Inspection Results Data

October 1, 2009
Author(s)
William G. Rippey
The Dimensional Markup Language (DML) specification defines a data model and Extensible Model Language (XML) encoding rules for dimensional inspection results for discrete parts. To support manufacturing quality assurance processes, DML results files are

Update on DMIS Certification

October 1, 2009
Author(s)
William G. Rippey
The Dimensional Standards Consortium (DMSC) and the National Institute of Standards and Technology (NIST) announced the rollout of the DMSC's DMIS Certification Program at the International Manufacturing Technology Show (IMTS), September 2008. The

Measurement Traceability and Quality Assurance in a Nanomanufacturing Environment

September 25, 2009
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Aaron Cordes, Benjamin Bunday, John Allgair
A key requirement for nano-manufacturing is maintaining acceptable traceability of measurements performed to determine size. Given that properties and functionality at the nanoscale are governed by absolute size, maintaining the traceability of dimensional

Electrochemical Micromachining of Hastelloy B-2 with Ultrashort Voltage Pulses

September 8, 2009
Author(s)
Gordon A. Shaw, Joseph J. Maurer, Steven E. Fick, Thomas P. Moffat, J. J. Mallett, John L. Hudson
Electrochemical micromachining (ECMM) with ultrashort voltage pulses, a maskless all-electrochemical micro and nanofabrication technique, has been used to fabricate microstructures on a corrosion resistant nickel-based superalloy, Hastelloy B-2. Because of

Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM

September 1, 2009
Author(s)
Michael T. Postek, Andras Vladar, John S. Villarrubia
The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is the

Formal Representation of Product Design Specifications for Validating Product Designs

August 27, 2009
Author(s)
Alex Weissman, Satyandra K. Gupta, Xenia Fiorentini, Sudarsan Rachuri, Ram D. Sriram
Large scale distributed design projects increasingly result in designs that do not fully conform to the stated design goals or specifications. Hence, there is a need to validate these designs against various requirements. For projects with a large set of

STEP-OAGIS Harmonization Joint Working Group, PDM Subgroup Interim Report

August 27, 2009
Author(s)
Xenia Fiorentini, Sudarsan Rachuri
In any manufacturing enterprise, there are two types of tools used to create and share product related data across its extended network. The engineering information of the product is created using what is commonly called engineering authoring tool (e.g

Input Data Management Methodology for Discrete Event Simulation

August 26, 2009
Author(s)
Nils E. Bengtsson, Guodong Shao, Yung-Tsun T. Lee, Swee K. Leong, Charles R. McLean, Bjorn Johansson, Anders Skoogh
Input Data Management (IDM) is a time consuming and costly process for Discrete Event Simulation (DES) projects. In this paper, a methodology for IDM in DES projects is described. The approach is to use a methodology to identify and collect data, then use

Representing Layout Information in the CMSD Specification

August 26, 2009
Author(s)
Frank H. Riddick, Yung-Tsun T. Lee
Developing mechanisms for the efficient exchange of information between simulations and other manufacturing tools is a critical problem. For many areas of manufacturing, neither representations for the information nor mechanisms for exchanging the

193 nm Angle-Resolved Scatterfield Microscope for Semiconductor Metrology

August 24, 2009
Author(s)
Martin Y. Sohn, Richard Quintanilha, Bryan M. Barnes, Richard M. Silver
An angle-resolved scatterfield microscope (ARSM( feating 193 nm excimer laser light wa developed for measuring critical dimension (CD) and overlay of nanoscale targets as used in semiconductor metrology. The microscope is designed to have a wide and

Enabling Flexible Manufacturing Systems by Using Level of Automation as Design Parameter

August 19, 2009
Author(s)
Bjoern J. Johansson, Asa Fasth, Johan Stahre, Juhani Heilala, Swee K. Leong, Yung-Tsun T. Lee, Frank H. Riddick
Handling flexibility in an ever changing manufacturing environment is one of the key challenges for a successful industry. By using tools for virtual manufacturing, industries can analyze and predict outcomes of changes before taking action to change the

System Builders Manual for Version 2.1.5 of the NIST DMIS Test Suite

August 19, 2009
Author(s)
Thomas R. Kramer, John A. Horst
This is a system builders manual for the NIST DMIS Test Suite, version 2.1.5. The purpose of the manual is to help system builders use software provided in the test suite for building systems that implement DMIS (the Dimensional Measuring Interface

Towards a Method for Harmonizing Information Standards

August 19, 2009
Author(s)
Xenia Fiorentini, Sudarsan Rachuri, Steven R. Ray, Ram D. Sriram
Designers and engineers use various engineering authoring tools, such as CAD, CAE, and PDM,, to generate information objects (engineering objects). On the business side, enterprise level business process modelers use various business authoring tools, such

Users Manual for Version 2.1.5 of the NIST DMIS Test Suite (for DMIS 5.1)

August 19, 2009
Author(s)
Thomas R. Kramer, John A. Horst
The NIST DMIS Test Suite, version 2.1.5, is described. The test suite is intended to serve two purposes, 1) to help users and vendors use version 5.1 of DMIS (the Dimensional Measuring Interface Standard) and 2) to provide utilities and test files for

Recommended Practices for Homeland Security Modeling and Simulation

August 13, 2009
Author(s)
Sanjay Jain, Charles McLean
This paper recommends practices for development and deployment of modeling, simulation and analysis (MS&A) tools for homeland security applications. The set of recommended practices applicable to any MS&A application includes: software engineering practice

A System Dynamics Modeling Framework for Sustainable Manufacturing

August 10, 2009
Author(s)
Deogratias Kibira, Sanjay Jain, Charles McLean
This paper proposes a framework for application of system dynamics modeling to sustainable manufacturing. Sustainable manufacturing involves interaction of multiple complex systems including those in manufacturing, environmental, financial, and social

Reference measurements of Hydrogen's Dielectric Permittivity

August 10, 2009
Author(s)
James W. Schmidt, Michael R. Moldover, Eric F. May
We used a quasi-spherical cavity resonator to measure the relative dielectric permittivity ε r of H 2 at frequencies from 2.4 GHz to 7.3 GHz, at pressures up to 6.5 MPa, and at the temperatures 273 K and 293 K. The resonator was calibrated using auxiliary

Recent developments in large-scale dimensional metrology

July 30, 2009
Author(s)
G Peggs, P.G Maropoulos, E.B Hughes, Alistair Forbes, S Robson, M Ziebart, Bala Muralikrishnan
With ever-more demanding requirements for the accurate manufacture of large components, dimensional measuring techniques are becoming progressively more sophisticated. This review describes some of the more recently-developed techniques and the state-of

Overview of MSA Needs for Homeland Security

July 29, 2009
Author(s)
Charles R. McLean, Sanjay Jain, Yung-Tsun Lee
A number of modeling, simulation and analysis (MSA) efforts have evolved to support homeland security initiatives. Various organizations involved in homeland security related work have realized the value of MSA and have funded development for their

System Testing Using Use Cases for an ER Simulation Model

July 29, 2009
Author(s)
Guodong Shao
Modeling and simulation (M&S) techniques are increasingly being used to solve problems and aid decision making in many different fields. It is particularly useful for Department of Homeland Security (DHS) applications because of its feature of non
Displaying 1126 - 1150 of 2125