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Displaying 1726 - 1750 of 2608

Project Team 4, the 2000-2005 Reference Standards Committee of the USP Council of Experts and Its Advisory Panel, USP Staff, Consultant: Official USP Reference Standards: Metrology Concepts, Overview, and Scientific Issues and Opportunities

December 1, 2006
Author(s)
Reenie M. Parris
The United States Pharmacopeia (USP) is a private standards-setting body created in 1820 by practitioners who wished to promote the quality of therapeutic products in commerce. The principal product of USP, then and now, is the United States Pharmacopeia

Evaluation Specimens for Izod Impact Machines (SRM 2115): Report of Analysis

October 1, 2006
Author(s)
Thomas A. Siewert, Jolene Splett, Raymond Santoyo
In the past few years, we have received a number of requests for verification specimens for Izod impact machines, similar to what we offer for Charpy impact machines. Although there are similarities between Izod and Charpy impact testing, there are some

Parametric Uncertainty in Optical Image Modeling

September 18, 2006
Author(s)
James E. Potzick, Egon Marx, M P. Davidson
Optical photomask feature metrology and wafer exposure process simulation both rely on optical image modeling for accurate results. While it is fair to question the accuracies of the available models, model results also depend on several input parameters

Illumination Optimization for Optical Semiconductor Metrology

September 1, 2006
Author(s)
Bryan M. Barnes, L Howard, Richard M. Silver
Uniform sample illumination via K hler illumination, is achieved by establishing a pair of conjugate focal planes; a light source is focused onto the condenser lens aperture while the image of the field aperture is focused at the plane of the specimen

Standards for Plasma and Serum Protoemics in Early Cancer Detection: A Needs Assessment Report From the NIST-NCI SMART Workshop, August 18-19, 2005

September 1, 2006
Author(s)
Peter E. Barker, Paul D. Wagner, Stephen E. Stein, David M. Bunk, S Srivastava, Gilbert Omenn
The National Institute of Standards and Technology (NIST) and the National Cancer Institute (NCI) co-sponsored a workshop on August 18-19, 2005 to examine needs for reference materials to support biomarker discovery for early cancer detection. Needs for

NIST Calibration Services for Water Flowmeters Water Flow Calibration Facility

August 1, 2006
Author(s)
Iosif I. Shinder, Iryna V. Marfenko
This document describes the Water Flow Calibration Facility (WFCF) at the National Institute of Standards and Technology (NIST). This facility has three parallel pipelines with diameters of 100, 200 and 400 mm and three weighing systems with capacities of

Ionic Liquids Database (ILThermo)

July 23, 2006
Author(s)
Qian Dong, Andrei F. Kazakov, Chris D. Muzny, Robert D. Chirico, Jason A. Widegren, Vladimir Diky, Joe W. Magee, Kenneth N. Marsh, Michael D. Frenkel
Ionic Liquids Database (ILThermo)is a free web research tool that allow users worldwide to access an up-to-data data collection from the publications on experimental studies of thermodynamic and transport properties of ionic liquids, as well as binary and

An Octagonal Architecture for High Strength PIT Nb 3 Sn Conductors

June 6, 2006
Author(s)
L. R. Motowidlo, E Barzi, D. Turrioni, Najib Cheggour, Loren F. Goodrich
Powder-in-Tube (PIT) Nb 3Sn conductors have been fabricated utilizing a low-cost intermetallic Cu 5Sn 4 powder as the tin source. A novel octagonal PIT design that incorporates dispersion strengthened copper as well as a hexagonal PIT design were

Consumer Package Labeling Guide: Selling by Length and Area

May 2, 2006
Author(s)
K M. Dresser
[Withdrawn (February 12, 2018)] Guide is intended to provide manufacturers, packers, distributors, and retailers of packaged products with information about the labeling requirements for commodities that are sold by length and area in the consumer

Weights and Measures in the United States

April 11, 2006
Author(s)
Carol T. Hockert
What does the weights and measures system in the United States look like, and what impact does it have on commerce? Every state in the United States has its own weights and measures program, and many states have county and city run programs within their

Bias Reduction in Roughness Measurement through SEM Noise Removal

March 24, 2006
Author(s)
R Katz, C D. Chase, R Kris, R Peltinov, John S. Villarrubia, B Bunday
The importance of Critical Dimension (CD) roughness metrics such as Line and Contact edge roughness (LER, CER) and their associated width metrics (LWR, CWR) have been dealt with widely in the literature and are becoming semiconductor industry standards

Early Results From the NIST M48 CMM in the New AML Facility

March 3, 2006
Author(s)
John R. Stoup, Bryon S. Faust, Theodore D. Doiron
The Advanced Measurement Laboratory at NIST in Gaithersburg has already provided real, measurable improvement in some dimensional metrology measurement processes at NIST, most notably in the performance of the NIST Moore M48 coordinate measuring machine1

Koehler Illumination for High-Resolution Optical Metrology

March 1, 2006
Author(s)
Martin Y. Sohn, Bryan M. Barnes, Lowell P. Howard, Richard M. Silver, Ravikiran Attota, Michael T. Stocker
Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler

Progress on Implementation of a CD-AFM Based Reference Measurement System

March 1, 2006
Author(s)
Ndubuisi G. Orji, Angela Martinez, Ronald G. Dixson, J Allgair
The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology. In semiconductor manufacturing, many of the measurements made in the fab are not traceable to the SI

The Limits of Image-Based Optical Metrology

March 1, 2006
Author(s)
Richard M. Silver, Bryan M. Barnes, Ravikiran Attota, Jay S. Jun, James J. Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J. Patrick, Ronald G. Dixson, Robert D. Larrabee
An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper. We have developed a set of techniques we refer to as scatterfield microscopy which allows

Traceable Atomic Force Microscope Dimensional Metrology at NIST

March 1, 2006
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Michael W. Cresswell, Richard A. Allen, William F. Guthrie
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. There are two major instruments being used for traceable measurements at NIST. The first is a custom in-house

Preparation of Reference Material 8504, Transformer Oil

February 1, 2006
Author(s)
Dianne L. Poster, Michele M. Schantz, Stephen A. Wise
A new reference material (RM), RM 8504, has been prepared for use as a diluent oil with Aroclors in transformer oil Standard Reference Materials (SRMs) 3075-3080 or SRM 3090 when developing and validating methods for the determination of polychlorinated
Displaying 1726 - 1750 of 2608