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Displaying 1826 - 1850 of 2608

Measurement Uncertainty, CMMs, and Standards: Today and the Future

January 1, 2005
Author(s)
Steven D. Phillips
Over the past decade modern measurement uncertainty evaluation has evolved from an obscure art practiced at National Measurement Institutes (NMIs) to an increasingly intertwined aspect of industrial metrology. This paper examines the progression of

New Capabilities At NIST In Dimensional Metrology

January 1, 2005
Author(s)
Theodore D. Doiron, Eric S. Stanfield, Bryon S. Faust, John R. Stoup, Mary Abbott
A number of new or revised services in dimensional metrology are presented. Included are: a lower cost, high accuracy calibration for sphere diameter; reduced uncertainty in roundness calibration; a new instrument for measurement of the thermal expansion

Photomask Metrology, Photomask Fabrication Technology

January 1, 2005
Author(s)
Richard M. Silver, Andras Vladar
In this paper we will focus on the different metrology techniques used to measure features on photomasks. In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability. The metrology

Scanning Electron Microscope Dimensional Metrology using a Model-based Library

January 1, 2005
Author(s)
John S. Villarrubia, Andras Vladar, Michael T. Postek
The semiconductor electronics industry places significant demands upon secondary electron imaging to obtain dimensional measurements that are used for process control or failure analysis. Tolerances for measurement uncertainty and repeatability are smaller

The Influence of Defects on the Morphology of Si (111) Etched in NHF

January 1, 2005
Author(s)
Hui Zhou, Joseph Fu, Richard M. Silver
We have implemented a kinetic Monte-Carlo (KMC) simulation to study the morphologies of Si (111) surfaces etched in NHF. Although our initial simulations reproduced the previous results from Hines, it failed to produce the morphologies observed in our

Internet-Based Surface Metrology Algorithm Testing System

December 1, 2004
Author(s)
Son H. Bui, Thomas B. Renegar, Theodore V. Vorburger, Jayaraman Raja, Mark C. Malburg
This paper presents the development of an Internet-based surface metrology algorithm testing system. The system includes peer-reviewed surface analysis tools and a surface texture specimen database for parameter evaluation and algorithm verification. The

Traceable Pico-Meter Level Step Height Metrology

December 1, 2004
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Joseph Fu, Theodore V. Vorburger
The atomic force microscope (AFM) increasingly being used as a metrology tool in the semiconductor industry where the features measured are at the nanometer level and continue to decrease. Usually the height sensors of the AFM are calibrated using step

NNI Workshop Instrumentation and Metrology for Nanotechnology

November 1, 2004
Author(s)
Michael T. Postek, J J. Pellegrino
The NNI Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenges was held on January 27-29, 2004 in Gaithersburg, Maryland, and was cosponsored by the National Institute of Standards and Technology (NIST), an agency of the

Virtual Surface Calibration and Computational Uncertainty

October 1, 2004
Author(s)
Son H. Bui, Theodore V. Vorburger, Thomas B. Renegar
This paper presents the development of a virtual surface calibration database for parameter evaluation and algorithm verification. The database runs from a web site at the National Institute of Standards and Technology (NIST), USA. Companies, universities

A Buckling-Based Metrology for Measuring the Elastic Moduli of Polymeric Thin Films

August 1, 2004
Author(s)
Christopher Stafford, Eva Simonyi, C Harrison, Kathryn Beers, Alamgir Karim, Eric J. Amis, Mark R. VanLandingham, H C. Kim, W Volksen, R D. Miller
As technology continues towards smaller, thinner and lighter devices, more stringent demands are placed on thin polymer films as diffusion barriers, dielectric coatings, electronic packaging and so on. Therefore, there is a growing need for testing

Quantifying Uncertainty in Nuclear Analytical Measurements

July 1, 2004
Author(s)
Lloyd A. Currie
This document resulted from a request at an International Atomic Energy Agency Consultants' Meeting. Information is based on a document Foundationsand future of detection and quantification limits prepared for the 1996 Proceedings of the Joint Statistical

Refractometry Using a Helium Standard

July 1, 2004
Author(s)
Jack A. Stone Jr., Alois Stejskal
The refractive index of helium at atmospheric pressure can be calculated from first principles with a very low uncertainty, on the order of 10^-10. Furthermore, the low refractive index of helium puts minimal demands on the pressure and temperature
Displaying 1826 - 1850 of 2608