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Displaying 1976 - 2000 of 2608

Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models

July 1, 2002
Author(s)
Richard M. Silver, Ravikiran Attota, Michael T. Stocker, Jay S. Jun, Egon Marx, Robert D. Larrabee, B Russo, M P. Davidson
In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool and

Scanning Electron Microscope Analog of Scatterometry

July 1, 2002
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek
Optical scatterometry has attracted a great deal of interest for linewidth measurement due to its high repeatability and capability of measuring sidewall shape. We have developed an analogous and complementary technique for the scanning electron microscope

The Challenge of Nanometrology

July 1, 2002
Author(s)
Michael T. Postek
The promise and challenge of nanotechnology is immense. The National Nanotechnology Initiative provides an opportunity to develop a new technological base for U.S. Industry. Nanometrology is the basis of the new measurement methods that must be developed

Two-dimensional Simulation Modeling in Imaging and Metrology Research

July 1, 2002
Author(s)
Michael T. Postek, Andras Vladar, J R. Lowney, William J. Keery
Traditional Monte Carlo modeling of the electron beam-specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam-landing location, or multiple

Tri-Alpha-Napthyl Benzene as a Crystalline or Glassy MALDI Matrix

April 19, 2002
Author(s)
Barry J. Bauer, Charles M. Guttman, Da-Wei Liu, William R. Blair
Tri-alpha-napthyl benzene (TANB) is used as a matrix in matrix-assisted laser desorption/ionization (MALDI) spectroscopy. Electrosprayed TANB is crystalline and has a melting point of 180 2 C. A glass of TANB is obtained with a glass transition temperature

In the Rough

March 1, 2002
Author(s)
Theodore V. Vorburger, Joseph Fu, N G. Orji
Surface roughness affects the function of a wide variety of engineering components, including airport runways, highways, ship hulls and mechanical parts. Perhaps the most demanding applications are in the optics and semiconductor industries. Surface

Handbook of Reference Data for Nondestructive Testing: Ultrasonics Chapter

February 14, 2002
Author(s)
John A. Slotwinski
The ASTM Handbook of Reference Data for Nondestructive Testing (NDT) is a collection of previously available NDT data for use by NDT practitioners. It is intended to be a ready reference guide, and will include chapters on several of the different NDT

A Laser Tracker Calibration System

January 1, 2002
Author(s)
Daniel S. Sawyer, Bruce R. Borchardt, Steven D. Phillips, Charles Fronczek, William T. Estler
We describe a laser tracker calibration system developed for frameless coordinate metrology systems. The system employs a laser rail to provide an 'in situ' calibrated length standard that is used to test a tracker in several different configurations. The

Characterizing CDSEM Metrology of 193 nm Resists at Ultra Low Voltage

January 1, 2002
Author(s)
N. Sullivan, M Mastovich, Ronald G. Dixson, P Knutruda, B Bunday, P Febrea, R Brandoma
Resist slimming under electron beam exposure introduces significant measurement uncertainty in the metrology of 193 nm resists. Total uncertainties, which approach 10 nm, can be realized through the combination of across wafer variation of line slimming

Deformation of Gauge Blocks

January 1, 2002
Author(s)
Theodore D. Doiron, Eric S. Stanfield, Dennis S. Everett
When a force is exerted on any material, the material deforms. Most of the time the effect is small and is neglected. In the measurement of gauge blocks, where the uncertainty goal is stated in nanometers, the deformation is a very large effect, and can be
Displaying 1976 - 2000 of 2608