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Displaying 2176 - 2200 of 2608

A New Method to Measure the Distance Between Graduation Lines on Graduated Scales

December 1, 1999
Author(s)
William B. Penzes, Robert Allen, Michael W. Cresswell, L Linholm, E C. Teague
Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally not

A General Quantitative Method to Validate Instrument Calibration Techniques

November 1, 1999
Author(s)
Steven D. Phillips
In this paper a method to validate proposed calibration procedures for coordinate measuring machines (CMMs) is presented. Conceptually, the validation procedure is based on a computer generated population of CMMs assumed to include any real CMM that a

Grating Pitch Measurements With the Molecular Measuring Machine

November 1, 1999
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 50 mm

Step Height Metrology for Data Storage Applications

November 1, 1999
Author(s)
R Koning, Ronald G. Dixson, Joseph Fu, Thomas Brian Renegar, Theodore V. Vorburger, V W. Tsai, Michael T. Postek
The measurements of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) are quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transition

Step-height Metrology for Data Storage Applications

November 1, 1999
Author(s)
R Koning, Ronald G. Dixson, Joseph Fu, Thomas Brian Renegar, Theodore V. Vorburger, V W. Tsai, Michael T. Postek
The measurement of bump heights and pit depth on compact discs (CD) with atomic force microscopes (AFMs) is quite different from the measurement of step heights on step height calibration standards. Both the bumps and the pits show much larger transition

Absolute Distance Interferometry with a 670-nm External Cavity Diode Laser

October 1, 1999
Author(s)
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of our

Absolute Interferometry With a 670 nm External Cavity Diode Laser

October 1, 1999
Author(s)
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
In the last few years there has been much interest in the use of tunable diode lasers for absolute interferometry. Here we report on the use of an external cavity diode laser operating in the visible (λ{approximately} 670 nm) for absolute distance

NORAMET Comparison of Gauge Block Measurement by Optical Interferometry

October 1, 1999
Author(s)
Jennifer Decker, A Lapointe, John R. Stoup, M V. Alonso, J R. Pekelsky
A varied assortment of 47 new and used steel, ceramic, chromium carbide and tungsten carbide gauge blocks from 9 manufacturers, ranging in length from 05. mm to 101.6 mm were calibrated by four laboratories from the NORAMET countries using the method of

Measurement as Inference: Fundamental Ideas

August 1, 1999
Author(s)
William T. Estler
We review the logical basis of inference as distinct from deduction, and show that measurements in general, and dimensional metrology in particular, are best viewed as exercises in probable inference: reasoning from incomplete information. The result of a

The NIST Length Scale Interferometer

July 23, 1999
Author(s)
John S. Beers, William B. Penzes
The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar to the

Effects of Defocus and Algorithm on Optical Step Height Calibration

July 1, 1999
Author(s)
Theodore D. Doiron, Theodore V. Vorburger, P Sullivan
Defocus effects on step height measurements by interferometric microscopy are estimated using different algorithms to calculate the step height. The interferometric microscope is a Mirau-type with a 20x objective and a numerical aperture (NA) of 0.4. Even

Extensions of the Single-Integral-Equation Method

July 1, 1999
Author(s)
Egon Marx
Scattering of electromagnetic waves by homogeneous dielectric or finitely conducting bodies can be reduced to the solution of integral equations. In the simpler cases, only a single-integral-equation is needed, with no increase of required memory over

Image Sharpness Measurement in Scanning Electron Microscope - Part III

July 1, 1999
Author(s)
Samuel N. Jones, Robert D. Larrabee, Michael T. Postek, Andras Vladar, Nien F. Zhang
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an

Rockwell Hardness - A Method-Dependent Standards Reference Material

July 1, 1999
Author(s)
Samuel Low, R Gettings, Walter S. Liggett Jr, Jun-Feng Song
Rockwell hardness is a method-dependent measurement of the deformation of a material in response to an applied force. It is not a fundamental physical property of a material. There are no alternative measurement systems to directly or independently measure

Voltage Modulation Scanned Probe Oxidation

July 1, 1999
Author(s)
F Perez-murano, K Birkelund, K Morimoto, John A. Dagata
Scanned probe microscope (SPM) oxidation with voltage modulation leads to a significant enhancement of the oxide growth rate, improvement of the aspect ratio of oxide features, and control of the structural and electrical properties of the SPM oxide

A Unique Institution: The History of NBS, 1950-1969

June 30, 1999
Author(s)
E Passaglia, K A. Beal
A follow-on to Measures for Progress by Rexmond C. Cochrane, this work covers the history of the National Bureau of Standards (NBS) from 1950-1969. While the book focuses on technical work, the management and administration of the Bureau are also discussed

Assessment Error Sources in Rockwell Hardness Measurements

June 1, 1999
Author(s)
Walter S. Liggett Jr, Samuel Low, David J. Pitchure, Jun-Feng Song
In the use of hardness test blocks, the uncertainty due to block non-uniformity can be reduced if one is willing to make measurements at specified locations on the blocks. Statistical methods for achieving this reduction are explained in this paper. The

Dimensional Metrology with the NIST Calibrated Atomic Force Microscope

June 1, 1999
Author(s)
Ronald G. Dixson, R Koning, V W. Tsai, Joseph Fu, Theodore V. Vorburger
Atomic force microscopes (AFMs) are increasingly used in the semiconductor industry as tools for submicrometer dimensional metrology. The scales of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed the

Intercomparison of SEM, AFM, and Electrical Linewidths

June 1, 1999
Author(s)
John S. Villarrubia, Ronald G. Dixson, Samuel N. Jones, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell
Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the sharp

Measurement Traceability to NIST Standard Rockwell Diamond Indenters

June 1, 1999
Author(s)
Jun-Feng Song
A metrology-based Rockwell hardness scale is established by a standard machine and a standard diamond indenter. Both must be established through force and dimensional metrology with acceptably small measurement uncertainties. In 1994, NIST developed a

Measurement Uncertainity and Noise in Nanometrology

June 1, 1999
Author(s)
James E. Potzick
The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such
Displaying 2176 - 2200 of 2608