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Displaying 2201 - 2225 of 2608

Optical Linewidth Models: Then and Now

June 1, 1999
Author(s)
Robert D. Larrabee, Richard M. Silver, M P. Davidson
In the late 1970's, Dr. Diana Nyyssonen demonstrated that NIST could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright-field microscope. She equated the known position of the

Telepresence: A New Paradigm for Industrial and Scientific Collaboration

June 1, 1999
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec
A portion of the mission of the National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. industry. The successful development of a Collaboratory for

Telepresence: A New Paradigm for Industrial and Scientific Collaboration

June 1, 1999
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec
The successful development of a collaboratory for Telepresence Microscopy (TPM) provides an important new tool to promote technology transfer in the areas of measurement technology. NIST and Texas Instruments (TI), under the auspices of the National

Toward Nanometer Accuracy Measurements

June 1, 1999
Author(s)
John A. Kramar, E Amatucci, David E. Gilsinn, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneling

Two-Dimensional Calibration Artifact and Measurement Methodology

June 1, 1999
Author(s)
Richard M. Silver, Theodore D. Doiron, William B. Penzes, S Fox, Edward A. Kornegay, S Rathjen, M Takac, D Owen
In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensional

High Accuracy High Speed Gaussian Filter in Surface Metrology

May 31, 1999
Author(s)
Y B. Yuan, Jun-Feng Song, Theodore V. Vorburger
Both (1+x^2)^(-n) and (sin x/x)^n functions are very close to the Gaussian distribution for large value of n. Based on these functions, two new algorithms are developed for designing high accuracy and high speed recursive type Gaussian digital filters. The

Measurements and Predictions of Light Scattering by Coatings

May 1, 1999
Author(s)
Theodore V. Vorburger, Egon Marx, M E. McKnight, Maria Nadal, P Y. Barnes, Alan Keith Thompson, Michael Galler, Fern Y. Hunt, Mark R. VanLandingham
We show comparisons between calculations and measurements of angle-resolved light scattering distributions from clear dielectric, isotropic coatings. The calculated distributions are derived from topography measurements performed with scanning white light

The NIST Length Scale Interferometer

May 1, 1999
Author(s)
John S. Beers, William B. Penzes
The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar to the

Improving Kinematic Touch Trigger Probe Performance

April 1, 1999
Author(s)
Steven D. Phillips, William T. Estler
Kinematic touch trigger probes are widely used on CMMs. This article gives CMM users advice on how to minimize the systematic errors associated with this class of probes.

Optical Linewidth Models - Then and Now

March 1, 1999
Author(s)
Robert D. Larrabee, Richard M. Silver, M P. Davidson
In the late 1970's Dr. Diana Nyyssonen demonstrated that the National Institute of Standards and Technology (NIST) could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright-field

Experimental Study of the NaK (3 1PI) State

February 1, 1999
Author(s)
E Laub, J Huennekens, R K. Namiotka, Zeina J. Kubarych, I Prodan, J La civita, S Webb, I Mazsa
We report the results of an optical-optical double resonance experiment to determine the NaK (3 1PI) state potential energy curve. In the first step, a narrow band cw laser (PUMP) is tuned to line center of a particular 2(A) (1 SIGMA+)(v?, J?) 1(X) (1

A Constrained Monte Carlo Simulation Method for the Calculation of CMM Measurement Uncertainty

January 1, 1999
Author(s)
Steven D. Phillips, Bruce R. Borchardt, Daniel S. Sawyer, William T. Estler, K Eberhardt, M Levenson, Marjorie A. McClain, Ted Hopp
We describe a Monte Carlo simulation technique where known information about a metrology system is employed as a constraint to distinguish the errors associated with the instrument under consideration from the set of all possible instrument errors. The

Algorithms for Calculating Single-Atom Step Heights

January 1, 1999
Author(s)
Joseph Fu, V W. Tsai, R Koning, Ronald G. Dixson, Theodore V. Vorburger
Recently, measuring Si(111) single atomic steps prompted us to investigate the measuring technique. The section technique is the most popular method for measuring the height. By measuring a simulated Si(111) atomic step, we have found it could have an

Diode Lasers in Length Metrology: Application to Absolute Distance Interferometry

January 1, 1999
Author(s)
Jack A. Stone Jr., Lowell P. Howard, Alois Stejskal
Diode lasers are becoming increasingly important in length metrology. In particular, the tunability of diode lasers makes them attractive for applications such as absolute distance interferometry (ADI). In this paper we describe the current status of our

Measurement Uncertainty and Noise in Nanometrology

January 1, 1999
Author(s)
James E. Potzick
The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such

Measurement Uncertainty and Uncorrected Bias

January 1, 1999
Author(s)
Steven D. Phillips, K Eberhardt, William T. Estler
This paper discusses the distinction between measurement uncertainty, measurement errors and their role in the calibration process. The issue of including uncorrected bias is addressed and a method to extend the current ISO Guide to the Expression of
Displaying 2201 - 2225 of 2608