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Displaying 2426 - 2450 of 2609

Test of a Slow Off-Axis Parabola at it

November 1, 1995
Author(s)
R E. Parks, Christopher J. Evans, Lianzhen Shao
We describe the interferometric testing of a slow (f/16 at the center of curvature) off-axis parabola, intended for use in an x-ray spectrometer, that uses a spherical wave front matched to the mean radius of the asphere. We find the figure error in the

1/N Feynman Machines as a Path to Ultraminiaturization

September 1, 1995
Author(s)
E C. Teague
The possibility of implementing Feynman''s proposal for achieving ultraminiaturization by an iterative process of three-dimensional machines making ever-smaller three-dimensional machines is considered in the nature of a thought experiment. A large array

Microform Calibration Uncertainties of Rockwell Diamond Indenters

September 1, 1995
Author(s)
Jun-Feng Song, F Rudder, Theodore V. Vorburger, J Smith
National and international comparisons in Rockwell hardness tests show significant differences. Uncertainties in the geometry of the Rockwell diamond indenters are largely responsible for these differences. By using a stylus instrument, with a series of

Rapidly Renewable Polishing Lap

September 1, 1995
Author(s)
Christopher J. Evans, R E. Parks
Textured laps can be created by slumping uniform thin films of appropriate materials over textured substrates that have been generated to the required figure. The film can easily be replaced and the lap shape is invariant since the lap substrate never

Frequency Stabilization of a Green He-Ne Laser

August 20, 1995
Author(s)
Jack A. Stone Jr., Alois Stejskal
A new process for stabilizing the frequency of commercially available 543 nm He-Ne lasers is described. The stabilization method is based on anomalous dispersion of the gain medium. A total of four green lasers have been stabilized - two at the National

Improved Photomask Metrology Through Exposure Emulation

July 1, 1995
Author(s)
James E. Potzick
The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial image in the wafer stepper, some are properties of the stepper projection system and some are

In Situ Testing and Calibrating of Z-Piezo of an Atomic Force Microscope

July 1, 1995
Author(s)
Joseph Fu
By scanning a slightly tilted, smooth surface with an atomic force microscope (AFM), it is possible to obtain hysteresis loops which contain information on the nonlinearity and hysteresis in the z axis of the AFM''s piezoelectric actuator. A 15% variation

NIST SRM 9983 High Rigidity Ball-Bar Stand User Manual

June 1, 1995
Author(s)
Daniel S. Sawyer, Steven D. Phillips, Gregory W. Caskey, Bruce R. Borchardt, David E. Ward, P Snoots
This document is the user manual for the NIST SRM 9983 High Rigidity Ball Bar Stand. The manual contains a list of the components that are included as part of the unit. Complete instructions for setting up and assembling the stand to support a ball bar for

The Gage Block Handbook

June 1, 1995
Author(s)
Theodore D. Doiron, John S. Beers
Gage blocks are the primary method used by industry to standardize the measurement of dimension. This work discusses every aspect of gage block calibration, including definitions, characteristics of gage blocks, calibration by interferometry and mechanical

Metrology with the Ultraviolet Scanning Transmission Microscope

May 1, 1995
Author(s)
Richard M. Silver, James E. Potzick, Y Hu
A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommodate

Overlay Measurements and Standards

May 1, 1995
Author(s)
Richard M. Silver, James E. Potzick, Robert D. Larrabee
The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In response to

Re-Evaluation of the Accuracy of NIST Photomask Linewidth Standards

May 1, 1995
Author(s)
James E. Potzick
Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This uncertainty is caused by a combination of those factors which influence the calibration measurement
Displaying 2426 - 2450 of 2609