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Search Publications by: John A. Kramar (Fed)

Displaying 26 - 50 of 88

Helium Ion Microscopy: A New Technique for Semiconductor Metrology and Nanotechnology

January 1, 2007

Author(s)

Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey

The Helium Ion Microscope (HIM) offers a new, potentially disruptive technique for nano-metrology. This methodology presents an approach to measurements for nanotechnology and nano-manufacturing which has several potential advantages over the traditional

SI-Traceable Spring Constant Calibration of Microfabricated Cantilevers for Small Force Measurement

September 14, 2006

Author(s)

Gordon A. Shaw, John A. Kramar, Jon R. Pratt

A variety of methods exist to measure the stiffness of microfabricated cantilever beams such as those used as mechanical sensors in atomic force microscopy (AFM). In order for AFM to be used as a quantitative small force measurement tool, these methods

New reference standards and artifacts for nanoscale physical property characterization

July 1, 2006

Author(s)

Jon R. Pratt, John A. Kramar, Gordon Shaw, Richard Gates, Paul Rice, John M. Moreland

This paper provides an overview of calibration artifacts being developed at the National Institute of Standards and Technology (NIST) that are intended to aid the accurate determination of nanoscale physical properties across a broad range of applications

Calibration of Microfabricated Cantilevers for SI-Traceable Small Force Measurement

January 1, 2006

Author(s)

Gordon A. Shaw, Jon R. Pratt, John A. Kramar

A procedure is described by which the spring constant of a microfabricated cantilever beam can be calibrated for the measurement of small forces in an atomic force microscope (AFM) or other device. The procedure utilizes dynamic force instrumented

Force Calibration Via Electrostatics

January 1, 2006

Author(s)

Jon R. Pratt, John A. Kramar, Gordon A. Shaw, Lee Kumanchik

We describe the electrical and length measurements necessary to realize micronewton forces in a fashion consistent with the International System of Units (SI). We first discuss instrumentation and procedures required to accurately characterize an

New Reference Standards and Artifacts for Nanoscale Physical Property Characterization

January 1, 2006

Author(s)

Jon R. Pratt, John A. Kramar, Gordon A. Shaw, Richard S. Gates, Paul Rice, John M. Moreland

SI Realization of Small Forces Using an Electrostatic Force Balance

January 1, 2006

Author(s)

Jon R. Pratt, John A. Kramar

We describe the realization of micronewton forces in a fashion consistent with the International System of Units (SI) using the National Institute of Standards and Technology (NIST) electrostatic force balance. A comparison between deadweight and

Nanometer Resolution Metrology with the NIST Molecular Measuring Machine

September 23, 2005

Author(s)

John A. Kramar

Nanometre accuracy and resolution metrology over technically relevant areas is becoming a necessity for the progress of nanomanufacturing. At the National Institute of Standards and Technology, we are developing the Molecular Measuring Machine, a scanned

Review of SI Traceable Force Metrology for Instrumented Indentation and Atomic Force Microscopy

September 23, 2005

Author(s)

David B. Newell, John A. Kramar, Jon R. Pratt, Douglas T. Smith

This paper reviews the current status of small force metrology for quantitative instrumented indentation and atomic force microscopy (AFM), and in particular focuses on new electrical and deadweight standards of force developed at the National Institute of

Active Vibration Isolation of a Large Stroke Scanning Probe Microscope by Using Discrete Sliding Mode Control

May 31, 2005

Author(s)

J Y. Yen, K J. Lan, John A. Kramar

Active vibration isolation is gaining increased attention in the ultra high precision applications to effectively treat the unavoidable ground vibration. The use of active vibration isolation is now being explored for the Molecular Measuring Machine (M 3)

Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing

February 1, 2005

Author(s)

Jon R. Pratt, John A. Kramar, David B. Newell, Douglas T. Smith

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughout, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant

Sliding Mode Control for Active Vibration Isolation of a Long Range Scanning Tunneling Microscope

October 29, 2004

Author(s)

K J. Lan, James H. Yen, John A. Kramar

An active vibration isolation (AVI) system has been designed and implemented for the Molecular Measuring Machine (M3) at the National Institute of Standards and Technology (NIST). NIST is investigating active vibration isolation as an approach to improving

Realizing and Disseminating the SI Micronewton With the Next Generation NIST Electrostatic Force Balance

October 1, 2004

Author(s)

Richard Seugling, David B. Newell, John A. Kramar, Jon R. Pratt

The NIST Electrostatic Force Balance (EFB) compares deadweight and mechanical probe forces to an SI realization of force derived from measurements of the capacitance gradient and voltage in an electronic null balance. In the following abstract, we briefly

Active Vibration Isolation for a Long-Range Scanning Tunneling Microscope

June 1, 2004

Author(s)

K J. Lan, J Y. Yen, John A. Kramar

Vibration Isolation or control is critical for the optimum operation of the Molecular Measuring Machine (M3), a high-resolution, length-metrology instrument at the National Institute of Standards and Technology. This paper describes the extension of the M3

Progress Towards SI Traceable Force Metrology for Nanomechanics

January 1, 2004

Author(s)

David B. Newell, Eric P. Whitenton, John A. Kramar, Jon R. Pratt, Douglas T. Smith

This paper is based, in its entirety, on NIST-approved publications: Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance, The NIST Electrostatic Force Balance Experiment, The NIST Microforce Realization and

Progress Towards Systeme International d'Unites Traceable Force Metrology for Nanomechanics

January 1, 2004

Author(s)

Jon R. Pratt, Douglas T. Smith, David B. Newell, John A. Kramar, Eric P. Whitenton

Recent experiments with the National Institute of Standards and Technology (NIST) Electrostatic Force Balance (EFB) have achieved agreement between an electrostatic force and a gravitational force of 10^(-5) N to within a few hundred pN/¿N. This result

Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance

November 16, 2003

Author(s)

Jon R. Pratt, David B. Newell, John A. Kramar, Eric P. Whitenton

The characterization of material properties and mechanical performance of micro-electromechanical devices often hinges on the accurate measurement of small forces. Calibrated load cells of appropriate size and range are used, but are often not calibrated

Dependence of Morphology on Miscut Angle for Si(111) Etched in NH(4)F

May 1, 2003

Author(s)

S Gonda, Joseph Fu, John A. Kramar, Richard M. Silver, Hui Zhou

Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH(4)F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the number of